Difference between revisions of "Dry Etching Recipes"

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{| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%"
 
{| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%"
 
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! width="725" height="45" colspan="15" | <div style="font-size: 150%;">Dry Etching Recipes</div>
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! width="725" height="45" colspan="16" | <div style="font-size: 150%;">Dry Etching Recipes</div>
 
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! width="300" bgcolor="#D0E7FF" align="center" colspan="4" | '''[[ICP Etching Recipes|ICP Etching]]'''
 
! width="300" bgcolor="#D0E7FF" align="center" colspan="4" | '''[[ICP Etching Recipes|ICP Etching]]'''
 
! bgcolor="#D0E7FF" align="center" colspan="4"|'''[[Oxygen Plasma System Recipes|Oxygen Plasma Systems]]'''
 
! bgcolor="#D0E7FF" align="center" colspan="4"|'''[[Oxygen Plasma System Recipes|Oxygen Plasma Systems]]'''
! bgcolor="#D0E7FF" align="center" colspan="2" |'''[[Other Dry Etcher Recipes|Other Dry Etchers]]'''
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! bgcolor="#D0E7FF" align="center" colspan="3" |'''[[Other Dry Etcher Recipes|Other Dry Etchers]]'''
 
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! width="65" bgcolor="#D0E7FF" align="center" | '''Material'''
 
! width="65" bgcolor="#D0E7FF" align="center" | '''Material'''
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| width="65" bgcolor="#DAF1FF" | [[RIE 3 (MRC)|RIE 3<br> (MRC)]]
 
| width="65" bgcolor="#DAF1FF" | [[RIE 3 (MRC)|RIE 3<br> (MRC)]]
 
| width="100" bgcolor="#DAF1FF" | [[RIE 5 (PlasmaTherm)|RIE 5<br>(PlasmaTherm)]]
 
| width="100" bgcolor="#DAF1FF" | [[RIE 5 (PlasmaTherm)|RIE 5<br>(PlasmaTherm)]]
| width="160" bgcolor="#DAF1FF" | [[Si Deep RIE (PlasmaTherm/Bosch Etch)|Si Deep RIE<br>(PlasmaTherm/Bosch Etch)]]
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| width="100" bgcolor="#DAF1FF" | [[Si Deep RIE (PlasmaTherm/Bosch Etch)|Si Deep RIE<br>(PTI/Bosch)]]
| width="120" bgcolor="#DAF1FF" | [[ICP Etch 1 (Panasonic E626I)|ICP Etch 1<br>(Panasonic E626I)]]
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| width="120" bgcolor="#DAF1FF" | [[ICP Etch 1 (Panasonic E626I)|ICP Etch 1<br>(Panasonic 1)]]
| width="120" bgcolor="#DAF1FF" | [[ICP Etch 2 (Panasonic E640)|ICP Etch 2<br>(Panasonic E640)]]
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| width="120" bgcolor="#DAF1FF" | [[ICP Etch 2 (Panasonic E640)|ICP Etch 2<br>(Panasonic 2)]]
 
| width="85" bgcolor="#DAF1FF" | [[ICP-Etch (Unaxis VLR)|ICP-Etch<br>(Unaxis VLR)]]
 
| width="85" bgcolor="#DAF1FF" | [[ICP-Etch (Unaxis VLR)|ICP-Etch<br>(Unaxis VLR)]]
 
| width="85" bgcolor="#DAF1FF" | [[Ashers (Technics PEII)|Ashers<br>(Technics PEII)]]
 
| width="85" bgcolor="#DAF1FF" | [[Ashers (Technics PEII)|Ashers<br>(Technics PEII)]]
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| width="85" bgcolor="#DAF1FF" | [[XeF2 Etch (Xetch)|XeF2 Etch<br>(Xetch)]]
 
| width="85" bgcolor="#DAF1FF" | [[XeF2 Etch (Xetch)|XeF2 Etch<br>(Xetch)]]
 
| width="85" bgcolor="#DAF1FF" | [[Vapor HF Etch|Vapor HF Etch<br>(uETCH)]]
 
| width="85" bgcolor="#DAF1FF" | [[Vapor HF Etch|Vapor HF Etch<br>(uETCH)]]
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| width="85" bgcolor="#DAF1FF" | [[Vapor HF Etch|CAIBE<br>(Oxford)]]
 
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| bgcolor="#DAF1FF" | [[XeF2 Etch (Xetch)|XeF2 Etch<br>(Xetch)]]
 
| bgcolor="#DAF1FF" | [[XeF2 Etch (Xetch)|XeF2 Etch<br>(Xetch)]]
 
| bgcolor="#DAF1FF" | [[Vapor HF Etch|Vapor HF Etch<br>(uETCH)]]
 
| bgcolor="#DAF1FF" | [[Vapor HF Etch|Vapor HF Etch<br>(uETCH)]]
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| bgcolor="#DAF1FF" | [[Vapor HF Etch|CAIBE<br>(Oxford)]]
 
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Revision as of 14:57, 9 July 2015