Difference between revisions of "Dry Etching Recipes"

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{| border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%" class="collapsible wikitable"
  
{| border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center; font-size: 95%" class="collapsible wikitable"
 
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! width="725" height="45" colspan="10" | <div style="font-size: 150%;">Dry Etching Recipes</div>
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! width="725" height="45" colspan="15" | <div style="font-size: 150%;">Dry Etching Recipes</div>
 
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!height="35" width="300" bgcolor="#D0E7FF" align="center" colspan="4" | '''[[RIE Etching Recipes|RIE Etching]]'''
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! width="300" bgcolor="#D0E7FF" align="center" height="35" colspan="4" | '''[[RIE Etching Recipes|RIE Etching]]'''
 
! width="300" bgcolor="#D0E7FF" align="center" colspan="5" | '''[[ICP Etching Recipes|ICP Etching]]'''
  
! width="300" bgcolor="#D0E7FF" align="center" colspan="5" | '''[[ICP Etching Recipes|ICP Etching]]'''
 
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!width="65" bgcolor="#D0E7FF" align="center" | '''Material'''
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! width="65" bgcolor="#D0E7FF" align="center" | '''Material'''
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|width="65" bgcolor="#DAF1FF" | [[RIE 1 (Custom)|RIE 1<br>(Custom)]]
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| width="65" bgcolor="#DAF1FF" | [[RIE 1 (Custom)|RIE 1<br>(Custom)]]
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|width="65" bgcolor="#DAF1FF" | [[RIE 2 (MRC)|RIE 2<br> (MRC)]]
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| width="65" bgcolor="#DAF1FF" | [[RIE 2 (MRC)|RIE 2<br> (MRC)]]
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|width="65" bgcolor="#DAF1FF" | [[RIE 3 (MRC)|RIE 3<br> (MRC)]]
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| width="65" bgcolor="#DAF1FF" | [[RIE 3 (MRC)|RIE 3<br> (MRC)]]
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|width="95" bgcolor="#DAF1FF" | [[RIE 5 (PlasmaTherm)|RIE 5<br>(PlasmaTherm)]]
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| width="95" bgcolor="#DAF1FF" | [[RIE 5 (PlasmaTherm)|RIE 5<br>(PlasmaTherm)]]
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|width="160" bgcolor="#DAF1FF" | [[Si Deep RIE (PlasmaTherm/Bosch Etch)|Si Deep RIE<br>(PlasmaTherm/Bosch Etch)]]
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| width="160" bgcolor="#DAF1FF" | [[Si Deep RIE (PlasmaTherm/Bosch Etch)|Si Deep RIE<br>(PlasmaTherm/Bosch Etch)]]
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|width="120" bgcolor="#DAF1FF" | [[ICP Etch 1 (Panasonic E626I)|ICP Etch 1<br>(Panasonic E626I)]]
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| width="120" bgcolor="#DAF1FF" | [[ICP Etch 1 (Panasonic E626I)|ICP Etch 1<br>(Panasonic E626I)]]
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|width="120" bgcolor="#DAF1FF" | [[ICP Etch 2 (Panasonic E640)|ICP Etch 2<br>(Panasonic E640)]]
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| width="120" bgcolor="#DAF1FF" | [[ICP Etch 2 (Panasonic E640)|ICP Etch 2<br>(Panasonic E640)]]
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|width="85" bgcolor="#DAF1FF" | [[ICP-Etch (Unaxis VLR)|ICP-Etch<br>(Unaxis VLR)]]
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| width="85" bgcolor="#DAF1FF" | [[ICP-Etch (Unaxis VLR)|ICP-Etch<br>(Unaxis VLR)]]
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Revision as of 13:48, 18 July 2012

Dry Etching Recipes
RIE Etching ICP Etching
Material RIE 1
(Custom) 		RIE 2
(MRC) 		RIE 3
(MRC) 		RIE 5
(PlasmaTherm) 		Si Deep RIE
(PlasmaTherm/Bosch Etch) 		ICP Etch 1
(Panasonic E626I) 		ICP Etch 2
(Panasonic E640) 		ICP-Etch
(Unaxis VLR)
Al
Ti
Cr
Ge
Ag
Ru
Mo
Ta
W
Al2O3
HfO2
ITo
SiO2
SiN
SiOxNy
Ta2O5
TiO2
TiN
ZnO2
ZrO2
GaAs
AlGaAs
InGaAlAs
InGaAsP
InP
GaN
AlGaN
AlN
GaN
AlGaN
AlN
GaSb
CdTe
ZnSe
Si
SiC
Sapphire
Retrieved from "https://wiki.nanofab.ucsb.edu/w/index.php?title=Dry_Etching_Recipes&oldid=1208"