Dry Etching Recipes

Process Control Data

See linked page for process control data (dep rate/stress etc. over time), for a selection of often-used thin-film depositions.

Dry Etching Tools/Materials Table

• R: Recipe is available. Clicking this link will take you to the recipe.
• A: Material is available for use, but no recipes are provided.

Dry Etching Recipes
	RIE Etching			ICP Etching						Oxygen Plasma Systems					Other Dry Etchers
Material	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	DSEIII (PlasmaTherm)	Fluorine ICP (PlasmaTherm)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	Oxford ICP (PlasmaPro 100)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)		Plasma Clean (YES EcoClean)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)
Ag																	A
Al			A			R	R										A
Au																	R
Cr			A			R	A										A
Cu																	A
Ge						A	A								A		A
Mo																	A
Nb						A	A
Ni																	R
Os						A	A
Pt																	R
Ru						A	R										A
Si				R	R			A							R		A
Ta						A	A										A
Ti						R	A										A
Al2O3						A	R										A
Al2O3 (Sapphire)						R	A										A
AlGaAs			R			R		R	R								A
AlGaN								R	R								A
AlN									R								A
BCB						A
CdZnTe	R																A
GaAs			R			R	R	R	R								A
GaN			R			R	A	R	R								A
GaSb						A	A	A	R								A
HfO2																	A
InGaAlAs	R							A	R								A
InGaAsP	R							R	R								A
InP	R					A	A	R	R								R
ITO	R																A
LiNbO3																	A
Photoresist & ARC		A	R		R	R	R			R		R					A
Ru						A	R
SiC						R	A										A
SiN		R			A	R	R			A							A
SiO2		R			R	R	R									R	A
SiOxNy						A	A										A
SU8						A
Ta2O5						A	A										A
TiN																	A
TiO2																	A
W-TiW						R	A										A
ZnO2																	A
ZnS	R																A
ZnSe	R																A
ZrO2																	A
Material	RIE 2 (MRC)	RIE 3 (MRC)	RIE 5 (PlasmaTherm)	DSEIII (PlasmaTherm)	Fluorine ICP (PlasmaTherm)	ICP Etch 1 (Panasonic E626I)	ICP Etch 2 (Panasonic E640)	Oxford ICP (PlasmaPro 100)	ICP-Etch (Unaxis VLR)	Ashers (Technics PEII)		Plasma Clean (YES EcoClean)	UV Ozone Reactor	Plasma Activation (EVG 810)	XeF2 Etch (Xetch)	Vapor HF Etch (uETCH)	CAIBE (Oxford)