Difference between revisions of "Direct-Write Lithography Recipes"
Jump to navigation
Jump to search
m ("Exposure Time" → "Exposure Dose (mJ/cm2)") |
(→Positive Resist (MLA150): added THMR recipe) |
||
| Line 86: | Line 86: | ||
|- |
|- |
||
|[[:File:3600 D, D2v Spin Speed Curve.pdf|THMR-3600HP]] |
|[[:File:3600 D, D2v Spin Speed Curve.pdf|THMR-3600HP]] |
||
| + | |1.5 krpm/45s250 rpm/s |
||
| ⚫ | |||
| + | |100°C/60s |
||
| − | | |
||
| ⚫ | |||
| − | | |
||
| − | | |
+ | |405 |
| + | |180–220 |
||
| − | | |
||
| + | |<nowiki>-4</nowiki> |
||
| − | | |
||
| + | |100°C/60s |
||
| − | | |
||
| + | |AZ300MiF |
||
| − | | |
||
| − | | |
+ | |20s |
| + | |line/space: |
||
| − | | |
||
| + | |||
| + | low dose for clear-field, high does for dark-field |
||
|} |
|} |
||
| Line 172: | Line 174: | ||
! width="300" |Comments |
! width="300" |Comments |
||
|- |
|- |
||
| + | |AZ4620 |
||
| − | |AZ4620Z5214 |
||
| − | | |
+ | |– krpm/30” |
|95°C/60” |
|95°C/60” |
||
| ⚫ | |||
| ⚫ | |||
| |
| |
||
| |
| |
||
| Line 183: | Line 185: | ||
|60" |
|60" |
||
| align="left" | |
| align="left" | |
||
| − | * |
+ | *TBD |
|} |
|} |
||
Revision as of 18:44, 10 October 2020
 Work In Progress This article is still under construction. It may contain factual errors. Content is subject to change. |
Maskless Aligner (Heidelberg MLA150)
Photolithography Recipes for the Heidelberg MLA150. Description of litho params- different lasers available, greyscale etc.
Positive Resist (MLA150)
General notes: Hotplates used, filters, laser wavelengths, etc.
| Resist | Spin Cond. | Bake | Thickness | Laser (nm) | Exposure Dose (mJ/cm2) | DeFocus | PEB | Developer | Developer Time | Comments |
|---|---|---|---|---|---|---|---|---|---|---|
| AZ4110 | 4 krpm/30s | 95°C/60s | ~ 1.1 µm | 405 | 240 | 5 | none | AZ400K:DI 1:4 | 50s | Used MLA design (good for isolated lines 0.8-1um) |
| AZ4330 | 4 krpm/30s | 95°C/60s | ~ 3.3 µm | 405 | 320 | 6 | none | AZ400K:DI 1:4 | 90s | Used MLA design |
| AZ4620 | ||||||||||
| SPR 220-3.0 | 2.5 krpm/30s | 115°C/90” | ~ 2.7 µm | 405 | 325 | - 4 | 115°C/90s | AZ300MIF | 60s | Used MLA design |
| SPR 955-CM0.9 | 3 krpm/30s | 95°C/90” | ~ 0.9 µm | 405 | 250 | - 7 | 110°C/90s | AZ300MIF | 60s | Used MLA design |
| THMR-3600HP | 1.5 krpm/45s250 rpm/s | 100°C/60s | 0.5 µm | 405 | 180–220 | -4 | 100°C/60s | AZ300MiF | 20s | line/space:
low dose for clear-field, high does for dark-field |
Negative Resist (MLA150)
General notes: Hotplates used, filters, laser wavelengths, etc.
| Resist | Spin Cond. | Bake | Thickness | Laser (nm) | Exposure Dose (mJ/cm2) | DeFocus | PEB | Flood | Developer | Developer Time | Comments |
|---|---|---|---|---|---|---|---|---|---|---|---|
| AZ5214 | 6 krpm/30s | 95°C/60s | ~ 1.0 µm | 375 | 35 | - 5 | 110°C/60s | 60" | AZ300MIF | 60s | Used UCSB design. Good for up to ~1.3um open line space. |
| AZnLOF2020 | 4 krpm/30s | 110°C/60s | ~ 2.1µm | 375 | 340 | - 3 | 110°C/60s | none | AZ300MIF | 90s | Used UCSB design. Good for 2um open line space. |
| SU-8 2075 | ~70µm | 375 | Extremely viscous. Pour into a wide-mouthed bottle, dispense directly from bottle. Replace napkin at end. |
Greyscale Lithography (MLA150)
Description...
| Resist | Spin Cond. | Bake | Thickness | Exposure Dose (mJ/cm2) | Focus Offset | PEB | Flood | Developer | Developer Time | Comments |
|---|---|---|---|---|---|---|---|---|---|---|
| AZ4620 | – krpm/30” | 95°C/60” | 60" | AZ300MIF | 60" |
|