Difference between revisions of "Direct-Write Lithography Recipes"
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''General notes: Hotplates used, filters, laser wavelengths, etc.'' |
''General notes: Hotplates used, filters, laser wavelengths, etc.'' |
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+ | |- bgcolor="#D0E7FF" |
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+ | ! width="100" |Resist |
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+ | ! width="100" |Spin Cond. |
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+ | ! width="75" |Bake |
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+ | ! width="75" |Thickness |
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+ | ! width="125" |Exposure Time |
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+ | ! width="100" |Focus Offset |
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+ | ! width="75" |PEB |
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+ | ! width="75" |Flood |
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+ | ! width="100" |Developer |
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+ | ! width="125" |Developer Time |
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+ | ! width="300" |Comments |
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+ | |- |
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+ | |AZ5214 |
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+ | |6 krpm/30” |
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+ | |95°C/60” |
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+ | |~ 1.0 um |
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+ | | |
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+ | | |
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+ | | |
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+ | |60" |
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+ | |AZ300MIF |
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+ | |60" |
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+ | | align="left" | |
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+ | *??? |
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+ | |} |
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+ | |||
+ | === Greyscale Lithography === |
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+ | ''Description...'' |
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Revision as of 23:34, 13 September 2020
Work In Progress This article is still under construction. It may contain factual errors. Content is subject to change. |
Maskless Aligner (Heidelberg MLA150)
Photolithography Recipes for the Heidelberg MLA150. Description of litho params- different lasers available, greyscale etc.
Positive Resist (MLA150)
General notes: Hotplates used, filters, laser wavelengths, etc.
Resist | Spin Cond. | Bake | Thickness | Exposure Time | Focus Offset | PEB | Developer | Developer Time | Comments |
---|---|---|---|---|---|---|---|---|---|
SPR955CM0.9 | 3 krpm/30” | 95°C/60” | ~ 0.9 um | AZ300MIF |
Negative Resist (MLA150)
General notes: Hotplates used, filters, laser wavelengths, etc.
Resist | Spin Cond. | Bake | Thickness | Exposure Time | Focus Offset | PEB | Flood | Developer | Developer Time | Comments |
---|---|---|---|---|---|---|---|---|---|---|
AZ5214 | 6 krpm/30” | 95°C/60” | ~ 1.0 um | 60" | AZ300MIF | 60" |
|
Greyscale Lithography
Description...
Resist | Spin Cond. | Bake | Thickness | Exposure Time | Focus Offset | PEB | Flood | Developer | Developer Time | Comments |
---|---|---|---|---|---|---|---|---|---|---|
AZ5214 | 6 krpm/30” | 95°C/60” | ~ 1.0 um | 60" | AZ300MIF | 60" |
|