Difference between revisions of "Direct-Write Lithography Recipes"
Jump to navigation
Jump to search
(Table inserted to start) |
m |
||
| Line 1: | Line 1: | ||
| + | |||
| − | {{recipes|Lithography}} |
||
{{WIP}} |
{{WIP}} |
||
| − | Photolithography Recipes for the Heidelberg MLA150 |
+ | Photolithography Recipes for the [[Maskless Aligner (Heidelberg MLA150)|Heidelberg MLA150]]. |
== Positive Resist (MLA150) == |
== Positive Resist (MLA150) == |
||
Revision as of 23:17, 13 September 2020
 Work In Progress This article is still under construction. It may contain factual errors. Content is subject to change. |
Photolithography Recipes for the Heidelberg MLA150.
Positive Resist (MLA150)
General notes: Hotplates used, filters, laser wavelengths, etc.
| Resist | Spin Cond. | Bake | Thickness | Exposure Time | Focus Offset | PEB | Developer | Developer Time | Comments |
|---|---|---|---|---|---|---|---|---|---|
| SPR955CM0.9 | 3 krpm/30” | 95°C/60” | ~ 0.9 um | AZ300MIF |
Negative Resist (MLA150)
General notes: Hotplates used, filters, laser wavelengths, etc.
| Resist | Spin Cond. | Bake | Thickness | Exposure Time | Focus Offset | PEB | Flood | Developer | Developer Time | Comments |
|---|---|---|---|---|---|---|---|---|---|---|
| AZ5214 | 6 krpm/30” | 95°C/60” | ~ 1.0 um | 60" | AZ300MIF | 60" |
|