Difference between revisions of "Direct-Write Lithography Recipes"

From UCSB Nanofab Wiki
Jump to navigation Jump to search
m
m
Line 2: Line 2:
 
[[category: Recipes]]
 
[[category: Recipes]]
 
{{WIP}}
 
{{WIP}}
 +
__TOC__
  
 
== Heidelberg Instruments MLA150 ==
 
== Heidelberg Instruments MLA150 ==

Revision as of 23:31, 13 September 2020

UnderConstruction.jpg

Work In Progress

This article is still under construction. It may contain factual errors. Content is subject to change.


Heidelberg Instruments MLA150

Photolithography Recipes for the Heidelberg MLA150. Description of litho params- different lasers available, greyscale etc.

Positive Resist (MLA150)

General notes: Hotplates used, filters, laser wavelengths, etc.

Resist Spin Cond. Bake Thickness Exposure Time Focus Offset PEB Developer Developer Time Comments
SPR955CM0.9 3 krpm/30” 95°C/60” ~ 0.9 um AZ300MIF

Negative Resist (MLA150)

General notes: Hotplates used, filters, laser wavelengths, etc.

Resist Spin Cond. Bake Thickness Exposure Time Focus Offset PEB Flood Developer Developer Time Comments
AZ5214 6 krpm/30” 95°C/60” ~ 1.0 um 60" AZ300MIF 60"
  • ???