Difference between revisions of "Develop Wet Benches"
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(Created page with "{{tool|{{PAGENAME}} |picture=DevelopBench.jpg |type = Wet Processing |super= Aidan Hopkins |phone=(805)839-3918x208 |location=? |email=hopkins@ece.ucsb.edu |description = Custom …") |
(Redirected page to Wet Benches#Develop Benches) |
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| + | #redirect [[Wet Benches#Develop Benches]] |
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| − | {{tool|{{PAGENAME}} |
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| − | |picture=DevelopBench.jpg |
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| − | |type = Wet Processing |
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| − | |super= Aidan Hopkins |
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| − | |phone=(805)839-3918x208 |
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| − | |location=? |
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| − | |email=hopkins@ece.ucsb.edu |
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| − | |description = Custom Developer Bench |
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| − | |manufacturer = Pure Aire Corporation |
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| − | |materials = |
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| − | }} |
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| − | = About = |
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| − | The facility contains 3 polypropylene Developing Benches for photolithographic development using TMAH / TEAH / KOH based developers. All is actively neutralized. The benches consist of two sinks with DI water hook ups and industrial water plenum flushes. Laminar flow fume hoods with hepa filtration. Nitrogen guns are also on both sides of the bench for drying samples. Digital hotplates are included for resist post exposure bakes or post develop hard bakes. POLOS spray puddle develop etch systems are included in the benches. All processes are done in user-supplied glassware. Two people may use the bench at a time and protective gear such as proper gloves must be used. Developers supplied by the laboratory include: AZ300MIF (0.26N TMAH developer), MF701 (0.24N TMAH developer), AZ400K (KOH based developer), pre-diluted AZ400K:DI 1:4. Other developers should be OK'd by laboratory staff prior to use in the laboratory. |
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| − | = Deatailed Specifications = |
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| − | *2 Sinks, DI water |
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| − | *2 Nitrogen guns for sample drying |
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| − | *'''NO SOLVENTS or STRIPPERS''' in bench |
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| − | *Class 100 |
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| − | *Hot plates for post bakes |
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| − | *POLOS Spray-Puddle-Develop-Rinse-Dry systems |
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Latest revision as of 07:39, 12 July 2012
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