DUV Flood Expose

From UCSB Nanofab Wiki
Revision as of 11:02, 15 June 2015 by Silva m (talk | contribs)
Jump to: navigation, search

<nowiki>Insert non-formatted text here<nowiki>Insert non-formatted text here</nowiki></nowiki>

DUV Flood Expose
Tool Type Lithography
Location Bay 6
Supervisor Mike Silva
Supervisor Phone (805) 893-3096
Supervisor E-Mail silva@ece.ucsb.edu
Description Deep UV Flood Exposer / Light source and HA-1KC2 power supply
Manufacturer AB Manufacturing


This unit consists of a collimated deep ultraviolet (DUV) light source (mercury gas discharge short arc lamp) and power supply. The substrate is placed on a rotating chuck (not presently working) and is exposed by opening a timer-controlled shutter.

Materials that are exposed are primarily spun-on thin films such as PMMA, PMGI, etc.

Detailed Specifications

  • DUV wavelengths are 200-260 nm; the lamp power is limited to either 1000 watts and can operate in either constant intensity or constant power mode
  • The full spectrum of Hg emission wavelengths from 200-450 nm is present on the sample
  • Exposure can be performed on a 4" wafer
  • Lamps are nominally rated for 400 hours
  • A reset timer was added in Feb. 1995 to limit "on" time (ie. provide for auto shut-off) for bulb life conservation

Spectra Images

DUV Exposure System Spectra

DUV Exposure System Spectra