Difference between revisions of "Calculators + Utilities"

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(→‎Example CAD File: link to ASML Example CAD file and Programming page)
 
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**''Boiling points of various compounds can tell you how volatile an etch product may be in a reactive ion etch, or whether they need to be wet-etched instead.''
  
**''Boiling points of various compounds can tell you how volatile an etch product may be in a reactive ion etch, or whether they need to be wet-etched instead.''
 
*[http://www.ioffe.ru/SVA/NSM/Semicond/index.html Physical Properties of Semiconductors (Ioffe Institute)]
  
*[http://www.ioffe.ru/SVA/NSM/Semicond/index.html Physical Properties of Semiconductors (Ioffe Institute)]
  +
*[https://www.lesker.com/newweb/deposition_materials/materialdepositionchart.cfm?pgid=0 Kurt J Lesker: Material Deposition Chart]
  +
**''Useful info about evaporating and sputtering many materials''
  +
*[https://www.lesker.com/newweb/ped/rateuniformity.cfm Kurt J. Lesker: Sputter Rates]
  +
**''Sputter rates of various materials, indicative or hardness and dry etching properties.''
   
 
==Wet Etching==
  
==Wet Etching==
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Powerful multi-layer layout program. Sophisticated object instantiation and array layout, to reduce files sizes and easily push changes to multiple cells.
  
Powerful multi-layer layout program. Sophisticated object instantiation and array layout, to reduce files sizes and easily push changes to multiple cells.
   
  +
*UCSB's ECE dept. provides an '''academic''' license for this software (no industrial users!), email [mailto:help@ece.ucsb.edu help@ece.ucsb.edu] to obtain the software.
−
*The NanoFab will provide a network license for academic users.
  
 
*Windows only.
  
*Windows only.
  +
*See [https://wiki.nanotech.ucsb.edu/wiki/Images/uploads/2018/LEdit_GettingStarted_CherryGupta.pdf this '''L-Edit Tutorial'''] for a good starter guide. Written by [https://scholar.google.com/citations?user=qKzZc7AAAAAJ&hl=en Cherry Gupta], courtesy of [https://me.ucsb.edu/people/sumita-pennathur Prof. Sumita Pennathur].
−
*[https://www.nanotech.ucsb.edu/wiki/index.php/Frequently_Asked_Questions#How_do_I_get_my_files_from_the_NanoFab_computers.3F Log into the NanoFiles SFTP server,] and download L-Edit & Install instructions from the <code>Manuals/Software</code> folder.
  
−
*See [https://www.nanotech.ucsb.edu/wiki/Images/uploads/2018/LEdit_GettingStarted_CherryGupta.pdf this L-Edit Tutorial] for a good starter guide. Written by [https://scholar.google.com/citations?user=qKzZc7AAAAAJ&hl=en Cherry Gupta], courtesy of [https://me.ucsb.edu/people/sumita-pennathur Prof. Sumita Pennathur].
  
   
 
====[https://www.klayout.de KLayout]====
  
====[https://www.klayout.de KLayout]====
−
A free, open-source, and fast/simple CAD tool for mask/reticle layout. Download at [https://www.klayout.de/ klayout.de].
 +
A free, open-source, and fast/simple CAD tool for mask/reticle layout. Also has powerful functions, DRC, scriptiable and can handle very large files (GB's) efficiently. Download at [https://www.klayout.de/ klayout.de].
   
 
*Available on Windows, Mac or *Nix.
  
*Available on Windows, Mac or *Nix.
  +
*Fast viewing of layer overlay, overlay multiple files, cell hierarchy, large (>1GB) files etc.
  +
*Supports the same core functionality as L-Edit - hierarchical Cell Instances, arrays, programmable Cells (PCells) etc.
 
*Easily scriptable with Python or Ruby, with decent tutorials.
  
*Easily scriptable with Python or Ruby, with decent tutorials.
  +
*[[KLayout Design Tips|<u>KLayout Design Tips</u>]]: important info on making "valid" CAD files, and setting up the program for efficient use.
−
*Fast and very effective viewing of layer overlay, overlay multiple files, cell hierarchy etc.
  
  +
*Univ. of Waterloo QNFCF produced some good [https://www.youtube.com/@qnfcf6093/videos '''''video tutorials on KLayout, here'''''].
−
*‘Before’ starting your design, set the '''''Layout Properties > Database Unit''''' to something small eg. 0.0001 µm (0.1nm).
  
  +
−
*The only confusing part about KLayout is how to draw circles. You have to draw a square, and then apply the '''''Edit>Selection>Round Corners''''' function. This is for compatibility, because GDS files do not have a "circle" primitive built-in. Make sure you include enough polygon points, eg. 200. See the [https://www.klayout.de/forum/discussion/142/making-circles forum help pages] on this for more info.
  
  +
====AutoCAD====
  +
Although AutoCAD can produce a valid DXF file, we see many design/conversion issues with these files. This is because many shapes and line-types (Line/polyline/LWLine for example) used in AutoCAD don't convert as expected into the polygons needed for printing. Also the DXF file format itself often creates problems, such as incorrect scaling or badly-filled/unclosed polygons.
   
 
====CAD Design Tips====
  
====CAD Design Tips====
−
It is highly recommended that you understand and use the concept of "Cells" in your design. This circumvents many problems with enormous file sizes (due to huge numbers of identical polygons), and if used properly, helps tremendously with programming the Stepper lithography machines. Links to documentation below:
  
   
  +
=====''Cells and Instancing''=====
−
*Create a new cell, and instancing that cell: [https://www.klayout.de/doc-qt4/manual/create_instance.html KLayout Docs : Creating a Cell instance]
  
  +
All major chip layout programs support "Cells" and similar structures for hierarchical layout. It is highly recommended that you understand and use the concept of "Cells" in your design. This circumvents many problems with enormous file sizes (due to huge numbers of identical polygons), and if used properly, helps tremendously with programming the Stepper lithography machines. Links to documentation below:
  +
  +
*Create a new cell, and instancing that cell: [https://www.klayout.de/doc/manual/create_instance.html KLayout Docs : Creating a Cell instance]
 
*Viewing only some levels of the heirachy, to prevent drawing all objects: [https://www.klayout.de/doc/manual/hier.html KLayout Docs: Viewing Cell Heirarchy]
  
*Viewing only some levels of the heirachy, to prevent drawing all objects: [https://www.klayout.de/doc/manual/hier.html KLayout Docs: Viewing Cell Heirarchy]
  +
  +
=====''File Types''=====
 
OASIS files tend to be much smaller than GDS files, and they also save the Layer Names (not just number). Alternatively, in KLayout the function '''File > Save Session''' will save the entire view including layer styles and window/zoom locations will be saved. You can share this file, as the entire design file is embedded within it, but it may not be as robust between KLayout versions.
  
OASIS files tend to be much smaller than GDS files, and they also save the Layer Names (not just number). Alternatively, in KLayout the function '''File > Save Session''' will save the entire view including layer styles and window/zoom locations will be saved. You can share this file, as the entire design file is embedded within it, but it may not be as robust between KLayout versions.
   
  +
DXF Files can often cause problems because the format varies widely depending on the program they are exported from. For example, DXF can lose the "scaling" causing polygons to be 1000x larger than expected, or unexpectedly cause some shares to get filled in.
−
==== Example CAD File ====
  
  +
  +
=====[[KLayout Design Tips|''KLayout Design Tips'']]=====
  +
See the above page for important info on making "valid" CAD files, and setting up KLayout for efficient use.
  +
  +
=====''Handling very large files''=====
  +
If you will be generating millions of identical shapes (eg. repeating array of circles), the file size can quickly become enormous due to all the stored polygon points. You can reduce the number of polygon points stored by:
  +
  +
#Reduce the number of points in each shape/circle if possible.
  +
#Use Cell instancing so that only one, or a few, polygons are defined, and that same polygon is then only referenced as a repeating Cell instance. (See above for tutorials).
  +
#The OAS file type generates much smaller files, and most photomask vendors can accept this. Photomask vendors are used to handling large files.
  +
#Photomask vendors are able to take multiple files and insert them into the final reticle – you just need to provide a clear schematic showing the exact insertion coordinates for each file (with respect to the origin of each file). They can also do some boolean operations (for a fee).
  +
  +
====Example CAD File====
 
Here is an example CAD file, showing the use of Layers and Cells, designed in KLayout. The device is fictional, for illustrative purposes only.
  
Here is an example CAD file, showing the use of Layers and Cells, designed in KLayout. The device is fictional, for illustrative purposes only.
  +
−
* [[Media:CAD_Tutorial_for_ASML_Reticle_v1.OAS|CAD_Tutorial_for_ASML_Reticle_v1.OAS]] (Demis D. John)
  
  +
*[//wiki.nanotech.ucsb.edu/w/images/a/ae/CAD_Tutorial_for_ASML_Reticle_v1.OAS CAD_Tutorial_for_ASML_Reticle_v1.OAS] , or [[Media:CAD Tutorial for ASML Reticle v1 GDS.gds|GDS version]] (''Demis D. John'')
−
* Cell "'''Device_Layout'''" shows a single device, with each ''Layer'' overlaid as it would be in a fabricated device. Each Layer (eg. a "process step" such as Mesa etch, Pad Metal etc.) is placed into it's own Cell.
  
  +
*Cell "'''Device_Layout'''" shows a single device, with each ''Layer'' overlaid as it would be in a fabricated device. Each Layer (eg. a "process step" such as Mesa etch, Pad Metal etc.) is placed into it's own Cell.
−
:[[File:CAD Tutorial for ASML Reticle v1 - screenshot Device Layout cell.png|alt=screenshot of KLayout view of Device_Layout|none|thumb|"Device_Layout" Cell showing as the "top cell"]]
  
  +
−
* Every Cell's ''Origin'' (0,0) lies on top of one another in the final ''Device_Layout''.
  
  +
:[[File:CAD Tutorial for ASML Reticle v1 - screenshot Device Layout cell.png|alt=screenshot of KLayout view of Device_Layout|none|thumb|530px|"Device_Layout" Cell showing as the "top cell"]]
−
** One way this can be accomplished is by selecting the objects/polygons you want to make into a new Cell, then use the function '''Edit >''' '''Selection > Make Cell''', and ''uncheck'' the "''Put Origin at...''" checkbox, so the new Cell maintains the same origin as the original view.
 
  +
−
* The Cell "'''Reticle_Layout'''" can be exported by itself (right-click the Cell name), with no other layers, for sending to the photomask manufacturer.
 
  +
*Every Cell's ''Origin'' (0,0) lies on top of one another in the final ''Device_Layout''.
−
* An example GDS file for submission to the photomask manufacturer can be [[Media:DEMISJAN2020_-_Reticle_Layout_v1.GDS|found here (download)]], with all objects moved to a single Layer.
  
  +
**One way this can be accomplished is by selecting the objects/polygons you want to make into a new Cell, then use the function '''Edit >''' '''Selection > Make Cell''', and ''uncheck'' the "''Put Origin at...''" checkbox, so the new Cell maintains the same origin as the original view.
−
* See the [[ASML 5500 Mask Making Guidelines#Example CAD File and Programming|ASML Mask Making Guidelines page]] for an example of how to program this Reticle into an ASML Stepper job.
  
  +
*The Cell "'''Reticle_Layout'''" can be exported by itself (right-click the Cell name), for sending to the photomask manufacturer.
  +
**[//wiki.nanotech.ucsb.edu/w/images/3/34/DEMISJAN2020_-_Reticle_Layout_v1.GDS Here is an example GDS file (download)] for submission to the photomask manufacturer, with all objects moved to a single Layer.
  +
*See the [[ASML 5500 Mask Making Guidelines#Example CAD File and Programming|ASML Mask Making Guidelines page]] for an example of how to program this Reticle into an ASML Stepper job.
  +
  +
====CAD Files & Templates====
  +
  +
=====General CAD files for Litho=====
  +
  +
*[[Media:Vented font DDJ.gds|Vented Font (GDS)]] - a font good for liftoff (no enclosed holes). (Designed by [[Demis D. John]])
  +
**See [https://www.klayout.de/forum/discussion/comment/6919/#Comment_6919 this comment] for instructions on installing the font into KLayout.[[File:Vented font screnshot.jpg|alt=Screenshot of Vented_font_DDJ.gds|none|thumb|200x200px|Vented font schematic.]]
  +
*[[Media:Vernier Template.gds|Alignment/Registration Vernier Scales (GDS)]] - used to measure the misalignment between different layers (step=0.1um). (Designed by [[Demis D. John]])
  +
**[http://www-inst.eecs.berkeley.edu/~ee143/fa10/lab/vernier.pdf How to use a Vernier Scale (UC Berkeley)][[File:Vernier Template v2 screenshot.jpg|alt=screenshot of vernier_template.gds CAD file|none|thumb|200x200px|Vernier Template schematic.]]
  +
*[[Resolution Test structures]] - '''''To Be Added'''''
  +
*Contact Alignment Mark:
  +
**[https://www.cnfusers.cornell.edu/contact_litho_alignment_keys#:~:text=Standard%20Contact%20Alignment%20Mark CNF Contact Marks] - designed by the Cornell Nanoscale Science & Technology Facility staff.
  +
***"''Polygons are Clear''" polarity, so 2nd layer has transparent region around alignment mark.
  +
**Male/female alignment marks with vernier (step=0.5um): [[Media:Contact-AlignMarks Vernier DemisDJohn v4.oas|OASIS]] / [[Media:Contact-AlignMarks Vernier DemisDJohn v4.gds|GDS]] format (Designed by [[Demis D. John]])
  +
***2nd layer has cells with both polarities
  +
  +
::[[File:Contact-AlignMarks Vernier DemisDJohn v3 Screenshot.png.png|alt=screenshot of Contact-AlignMarks_Vernier_DemisDJohn_v3.oas|none|thumb|200x200px|Alignment Mark with Vernier]]
  +
  +
=====GCA Stepper=====
  +
  +
*[[:File:GCA Stepper MaskPlate Master-DarkField 5x.gds|GCA Photomask Template]]: Dark-field (polygons/objects are clear) at 5x Magnification (GDS)
  +
**''This template is designed to be submitted to the photomask vendor to print as-is, no scaling applied.''
  +
**''Insert your designs into the template as Instances scaled UP by 5x.''
  +
**''During exposure, set the blades to 90/90 to block out AutoStep200 DFAS openings''
  +
*[[Media:GCA Global Mark.gds|GCA Global Alignment Mark CAD File (GDS)]]
  +
*[[:File:GCA Local Alignment Mark.gds|GCA Local Alignment Mark (GDS)]]
  +
*[[:File:GCA Local Alignment Mark Dotted.gds|GCA Local Alignment Mark Dotted (GDS)]] - helps for low-contrast topography
  +
  +
=====ASML Stepper=====
  +
  +
*[[:File:ASML On Wafer Mark.gds|ASML On-Wafer Alignment Mark (GDS)]] - see more info on [[ASML 5500 Mask Making Guidelines#Templates|the ASML Stepper#3 page]].
  +
*[[Calculators + Utilities#Example%20CAD%20File|Example Reticle/Mask CAD File]], designed in [[Calculators + Utilities#KLayout|KLayout]].
  +
  +
=====Heidelberg MLA150=====
  +
  +
*[[MLA150 - CAD Files and Templates]]
  +
  +
=====Other sources of lithography CAD files=====
  +
  +
*[https://www.mems-exchange.org/users/litho-templates/ MEMS Exchange] - has some useful alignment markers, registration/alignment verniers etc.
  +
*[https://www.epfl.ch/research/facilities/cmi/process/photolithography/layout-design/ EPFL CMi] - CMi layout template has some useful guidelines and resolution test structures.
   
 
===General Calculators===
  
===General Calculators===
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===Python Scripts===
  
===Python Scripts===
−
''These scripts are best run in the [https://pythonhosted.org/spyder/installation.html Spyder IDE], which is easily installed via [https://www.anaconda.com/download/ Anaconda], [http://python-xy.github.io Python(X,Y)], or by directly compiling Spyder using a command-line package manager.''
 +
''These scripts are best run in the [https://pythonhosted.org/spyder/installation.html Spyder IDE], which is easily installed via [https://www.anaconda.com/download/ Anaconda], [http://python-xy.github.io Python(X,Y)].''
  +
  +
'''If you use/modify these scripts in a publication, <u>please consider citing the author(s)</u>.''' See our [[Frequently Asked Questions#Authorship on Publications|publication policy]] for more info.
  +
  +
====[https://github.com/demisjohn/Keithley-I-V-Sweep Keithley I-V Sweep]====
  +
  +
*Sweep voltage and plot current vs. voltage using a Keithley SMU.
  +
*Already installed at the Probe Station in Bay 4, and on the QFI Thermal Microscope (Use '''''Spyder (Anaconda Python)''''' to run).
  +
*Requires the [https://pyvisa.readthedocs.io/en/stable/ pyvisa] python module.
  +
  +
====[https://github.com/demisjohn/QFI-Scope-Thermal-Analysis QFIScope Thermal Analysis (Demis D. John)]====
  +
  +
*Import 2D temperature data from the [[IR Thermal Microscope (QFI)]] and plot temperature profiles at user-specified locations.
  +
*Already installed on the QFI Infrared Microscope.
  +
  +
====[[Laser Etch Monitor Simulation in Python|Laser Etch Monitor Simulation in Python (Demis D. John)]]====
  +
  +
*Simulate your laser endpoint signal as you dry-etch through a stack of thin-film layers, using an open-source electromagnetics module.
  +
  +
====[https://github.com/lbolla/EMpy/blob/master/examples/nk.py Optical Constants of Nanofab Films - nk.py (Demis D. John)]====
   
  +
*Python functions for returning '''''n''''' (refractive index) & '''''k''''' (extinction coefficient) of various NanoFab thin-films at a specified wavelength (aka. optical dispersion models)
−
*[https://github.com/demisjohn/Keithley-I-V-Sweep Keithley I-V Sweep]
  
−
**Sweep voltage and plot current vs. voltage using a Keithley SMU.
  
−
**Already installed at the Probe Station in Bay 4, and on the QFI Thermal Microscope (Use '''''Python(X,Y)''''' to run).
  
−
**Requires the [https://pyvisa.readthedocs.io/en/stable/ pyvisa] python module.
  
−
*[https://github.com/demisjohn/QFI-Scope-Thermal-Analysis QFIScope Thermal Analysis]
  
−
**Import 2D temperature data from the [[IR Thermal Microscope (QFI)]] and plot temperature profiles at user-specified locations.
  
−
**Already installed on the QFI Infrared Microscope.
  
−
*[[Laser Etch Monitor Simulation in Python|Laser Etch Monitor Simulation in Python]]
  
−
**Simulate your laser endpoint signal as you dry-etch through a stack of thin-film layers, using an open-source electromagnetics module.
  
−
*[https://github.com/lbolla/EMpy/blob/master/examples/nk.py nk.py (Demis D. John)]
  
−
**''Python functions for returning'' '''n''' ''(ref. idx.) &'' '''k''' ''(ext. coeff.) of various NanoFab thin-films at a specified wavelength (aka. dispersion models).''
  

Latest revision as of 22:44, 4 April 2024

This page lists a few online calculators and utilities that are useful to lab users.

Fabrication Processes & Converters

Material Parameters

Wet Etching

Refractive Indices

Optical constants of many common materials. Useful for Optical thin-film analysis (ellipsometry/spectroscopic fitting), laser etch monitoring, optical filter/mirror/anti-reflection coating design, photonic devices etc.

Scripts + Programs

Analysis Programs

  • AmScope Software - microscope image analysis software
    • AmScope Calibration File containing calibrations for all NanoFab microscopes: Download Here
    • Also available on Nanofiles-SFTP / Manuals / Amscope
  • FIJI - scientific image anaylsis software
  • Gwyddion - free analysis software for Atomic Force Microscopes (AFMs) and other 3D data.
    • Sophisticated leveling, slicing, roughness/particulate analysis functions etc.
    • Can open Bruker NanoScope files, from the AFM
  • ProfilmOnline.com (Filmetrics) - online analysis/storage/sharing of 3D topographical data and images.
    • You can share an interactive 3D render of your AFM or Profilm3D scans with this tool.
    • Example AFM Scan, taken with NanoFab equipment, shared online for interactive analysis (slice, flatten etc.).

CAD Layout Programs

Use these for designing your lithography mask plates.

L-Edit

Powerful multi-layer layout program. Sophisticated object instantiation and array layout, to reduce files sizes and easily push changes to multiple cells.

KLayout

A free, open-source, and fast/simple CAD tool for mask/reticle layout. Also has powerful functions, DRC, scriptiable and can handle very large files (GB's) efficiently. Download at klayout.de.

  • Available on Windows, Mac or *Nix.
  • Fast viewing of layer overlay, overlay multiple files, cell hierarchy, large (>1GB) files etc.
  • Supports the same core functionality as L-Edit - hierarchical Cell Instances, arrays, programmable Cells (PCells) etc.
  • Easily scriptable with Python or Ruby, with decent tutorials.
  • KLayout Design Tips: important info on making "valid" CAD files, and setting up the program for efficient use.
  • Univ. of Waterloo QNFCF produced some good video tutorials on KLayout, here.

AutoCAD

Although AutoCAD can produce a valid DXF file, we see many design/conversion issues with these files. This is because many shapes and line-types (Line/polyline/LWLine for example) used in AutoCAD don't convert as expected into the polygons needed for printing. Also the DXF file format itself often creates problems, such as incorrect scaling or badly-filled/unclosed polygons.

CAD Design Tips

Cells and Instancing

All major chip layout programs support "Cells" and similar structures for hierarchical layout. It is highly recommended that you understand and use the concept of "Cells" in your design. This circumvents many problems with enormous file sizes (due to huge numbers of identical polygons), and if used properly, helps tremendously with programming the Stepper lithography machines. Links to documentation below:

File Types

OASIS files tend to be much smaller than GDS files, and they also save the Layer Names (not just number). Alternatively, in KLayout the function File > Save Session will save the entire view including layer styles and window/zoom locations will be saved. You can share this file, as the entire design file is embedded within it, but it may not be as robust between KLayout versions.

DXF Files can often cause problems because the format varies widely depending on the program they are exported from. For example, DXF can lose the "scaling" causing polygons to be 1000x larger than expected, or unexpectedly cause some shares to get filled in.

KLayout Design Tips

See the above page for important info on making "valid" CAD files, and setting up KLayout for efficient use.

Handling very large files

If you will be generating millions of identical shapes (eg. repeating array of circles), the file size can quickly become enormous due to all the stored polygon points. You can reduce the number of polygon points stored by:

  1. Reduce the number of points in each shape/circle if possible.
  2. Use Cell instancing so that only one, or a few, polygons are defined, and that same polygon is then only referenced as a repeating Cell instance. (See above for tutorials).
  3. The OAS file type generates much smaller files, and most photomask vendors can accept this. Photomask vendors are used to handling large files.
  4. Photomask vendors are able to take multiple files and insert them into the final reticle – you just need to provide a clear schematic showing the exact insertion coordinates for each file (with respect to the origin of each file). They can also do some boolean operations (for a fee).

Example CAD File

Here is an example CAD file, showing the use of Layers and Cells, designed in KLayout. The device is fictional, for illustrative purposes only.

  • CAD_Tutorial_for_ASML_Reticle_v1.OAS , or GDS version (Demis D. John)
  • Cell "Device_Layout" shows a single device, with each Layer overlaid as it would be in a fabricated device. Each Layer (eg. a "process step" such as Mesa etch, Pad Metal etc.) is placed into it's own Cell.
screenshot of KLayout view of Device_Layout
"Device_Layout" Cell showing as the "top cell"
  • Every Cell's Origin (0,0) lies on top of one another in the final Device_Layout.
    • One way this can be accomplished is by selecting the objects/polygons you want to make into a new Cell, then use the function Edit > Selection > Make Cell, and uncheck the "Put Origin at..." checkbox, so the new Cell maintains the same origin as the original view.
  • The Cell "Reticle_Layout" can be exported by itself (right-click the Cell name), for sending to the photomask manufacturer.
  • See the ASML Mask Making Guidelines page for an example of how to program this Reticle into an ASML Stepper job.

CAD Files & Templates

General CAD files for Litho
screenshot of Contact-AlignMarks_Vernier_DemisDJohn_v3.oas
Alignment Mark with Vernier
GCA Stepper
ASML Stepper
Heidelberg MLA150
Other sources of lithography CAD files
  • MEMS Exchange - has some useful alignment markers, registration/alignment verniers etc.
  • EPFL CMi - CMi layout template has some useful guidelines and resolution test structures.

General Calculators

  • Anaconda Python
    • A free Matlab-like IDE and GUI, using the Python language. The Spyder interface is modeled after Matlab.
    • Includes the scientific Python libraries needed for array math (numpy), plotting (matplotlib), data science (pandas) and many others. Many open-source packages are available to extend capabilities. The PyVisa module adds equipment control capabilities for automated measurements.
  • Wolfram Alpha
    • A versatile online interpreter/calculator, allowing calculations such as "Volume of 1.5g of Silicon", "melting point of SiO2" or "520°C in Fahrenheit".

Python Scripts

These scripts are best run in the Spyder IDE, which is easily installed via Anaconda, Python(X,Y).

If you use/modify these scripts in a publication, please consider citing the author(s). See our publication policy for more info.

Keithley I-V Sweep

  • Sweep voltage and plot current vs. voltage using a Keithley SMU.
  • Already installed at the Probe Station in Bay 4, and on the QFI Thermal Microscope (Use Spyder (Anaconda Python) to run).
  • Requires the pyvisa python module.

QFIScope Thermal Analysis (Demis D. John)

  • Import 2D temperature data from the IR Thermal Microscope (QFI) and plot temperature profiles at user-specified locations.
  • Already installed on the QFI Infrared Microscope.

Laser Etch Monitor Simulation in Python (Demis D. John)

  • Simulate your laser endpoint signal as you dry-etch through a stack of thin-film layers, using an open-source electromagnetics module.

Optical Constants of Nanofab Films - nk.py (Demis D. John)

  • Python functions for returning n (refractive index) & k (extinction coefficient) of various NanoFab thin-films at a specified wavelength (aka. optical dispersion models)
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