Automated Coat/Develop System (S-Cubed Flexi)

Automated Coat/Develop System (S-Cubed Flexi) Location Bay 7 Tool Type Wet Processing Manufacturer S-Cubed Model Flexi (Custom) Description Automatic Coat/Bake/Develop Primary Supervisor Tony Bosch (805) 893-3486 bosch@ece.ucsb.edu Secondary Supervisor Lee Sawyer Recipes Wet Processing Recipes SignupMonkey: Sign up for this tool

This Tool is now available for training - please contact the supervisor. 2022-11-01

About

The S3-Coater is a Coater/Developer system that has one photoresist spinner, one developer spinner and 4 hotplates each with independent temperature control and a chill plate. A central robot picks your wafer/s from one of 2 cassettes, processes them and returns them to the cassette. The system is recipe driven with a high degree of process control and minimal backside contamination, and coats photoresists with low particle counts/streaks and high uniformity.

At this time only full size substrates are allowed on this system. The S3 Coater is still in process development and not open for general use.

Detailed Specifications

• Wafer Size: 100mm (150mm possible but not set up)
• PR Coating Properties:
  • Uniformity < 1.0%
  • < 100 particles on 100mm wafer
• Photoresists/Underlayers Available:
  • UV6-0.8
  • DS-K101-304
  • PMMA - NOT FOR PUBLIC USE AT THIS TIME
  • PMGI SF11 - NOT FOR GENERAL USE AT THIS TIME
  • PMGI SF5 - NOT FOR GENERAL USE AT THIS TIME
• Solvents Available:
  • EBR100 (wafer backside cleaning)
• Developers Available:
  • AZ 300 MiF - NOT FOR GENERAL USE AT THIS TIME

Process Information

• Recipe Page for S-Cubed Coater: Lithography Recipes > Automated Coat/Develop System Recipes (S-Cubed Flexi)
• See the Photolith. Chemicals page for info on the installed resists.

Operating Procedures

• Standard Operating Procedure - For running pre-written recipes only.

Recipes

Recipes > Lithography > Automated Coater Recipes - See all available spin-coat recipes for this machine. Only Staff may edit/create recipes.