Atomic Layer Deposition Recipes

From UCSB Nanofab Wiki
Revision as of 16:27, 15 July 2013 by Prezioso m (talk | contribs)
Jump to: navigation, search

Back to Vacuum Deposition Recipes.

Atomic Layer Deposition (Oxford FlexAL)

Al2O3 deposition (ALD)

AlN deposition (ALD)

HfO2 deposition (ALD)

SiO2 deposition (ALD)

ZrO2 deposition (ALD)

TiO2 deposition (ALD)

  • TiO2 200 recipe WJM_TDMAT_H2O_r2 water dose 1s (pdf file to be added)gives grow rate 0.11 nm/cy as measured by ellipsometer