Atomic Layer Deposition Recipes

From UCSB Nanofab Wiki
Revision as of 17:16, 24 July 2013 by Prezioso m (talk | contribs)
Jump to navigation Jump to search

Back to Vacuum Deposition Recipes.

Atomic Layer Deposition (Oxford FlexAL)

Al2O3 deposition (ALD)

AlN deposition (ALD)

HfO2 deposition (ALD)

SiO2 deposition (ALD)

ZrO2 deposition (ALD)

TiO2 deposition (ALD)

  • TiO2 200 recipe WJM_TDMAT_H2O_r2 water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer