Difference between revisions of "Atomic Layer Deposition Recipes"

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==TiO{{sub|2}} deposition (ALD)==
 
==TiO{{sub|2}} deposition (ALD)==
*TiO{{sub|2}} 200 recipe '''WJM_TDMAT_H2O_r2''' water dose 1s (pdf file to be added)gives grow rate 0.11 nm/cy as measured by ellipsometer
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*TiO{{sub|2}} 200 recipe '''WJM_TDMAT_H2O_r2''' water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer

Revision as of 17:16, 24 July 2013

Back to Vacuum Deposition Recipes.

Atomic Layer Deposition (Oxford FlexAL)

Al2O3 deposition (ALD)

AlN deposition (ALD)

HfO2 deposition (ALD)

SiO2 deposition (ALD)

ZrO2 deposition (ALD)

TiO2 deposition (ALD)

  • TiO2 200 recipe WJM_TDMAT_H2O_r2 water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer