Difference between revisions of "Atomic Layer Deposition Recipes"
Jump to navigation
Jump to search
Prezioso m (talk | contribs) |
Prezioso m (talk | contribs) |
||
| Line 23: | Line 23: | ||
==TiO{{sub|2}} deposition (ALD)== | ==TiO{{sub|2}} deposition (ALD)== | ||
| − | *TiO{{sub|2}} 200 recipe '''WJM_TDMAT_H2O_r2''' water dose 1s (pdf file to be added)gives grow rate 0. | + | *TiO{{sub|2}} 200 recipe '''WJM_TDMAT_H2O_r2''' water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer |
Revision as of 17:16, 24 July 2013
Back to Vacuum Deposition Recipes.
Atomic Layer Deposition (Oxford FlexAL)
Al2O3 deposition (ALD)
AlN deposition (ALD)
HfO2 deposition (ALD)
SiO2 deposition (ALD)
ZrO2 deposition (ALD)
TiO2 deposition (ALD)
- TiO2 200 recipe WJM_TDMAT_H2O_r2 water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer