Difference between revisions of "Atomic Layer Deposition Recipes"

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==TiO{{sub|2}} deposition (ALD)==
 
==TiO{{sub|2}} deposition (ALD)==
TiO{{sub|2}} recipe '''WJM_TDMAT_H2O_r2''' water dose 1s, at 200C, gives grow rate 0.11 nm/cy (pdf file to be added)
+
TiO{{sub|2}} recipe '''WJM_TDMAT_H2O_r2''' water dose 1s, at 200C, gives grow rate 0.11 nm/cy as measured by ellipsometer (pdf file to be added)

Revision as of 16:40, 4 July 2013

Back to Vacuum Deposition Recipes.

Atomic Layer Deposition (Oxford FlexAL)

Al2O3 deposition (ALD)

AlN deposition (ALD)

HfO2 deposition (ALD)

SiO2 deposition (ALD)

ZrO2 deposition (ALD)

TiO2 deposition (ALD)

TiO2 recipe WJM_TDMAT_H2O_r2 water dose 1s, at 200C, gives grow rate 0.11 nm/cy as measured by ellipsometer (pdf file to be added)