Difference between revisions of "Atomic Layer Deposition Recipes"
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(added "contact bill mitchell" and Added Ru) |
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==Pt deposition (ALD)== |
==Pt deposition (ALD)== |
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| + | (Platinum) |
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| − | *Need Data |
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| + | *To be added, recipe available. Contact [[Bill Mitchell]]. |
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| + | |||
| + | == Ru (ALD) == |
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| + | (Ruthenium) |
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| + | * To be added, recipe available. Contact [[Bill Mitchell]]. |
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==SiO{{sub|2}} deposition (ALD)== |
==SiO{{sub|2}} deposition (ALD)== |
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==TiN deposition (ALD)== |
==TiN deposition (ALD)== |
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| + | *To be added, recipe available. Contact [[Bill Mitchell]]. |
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| − | *Need Data |
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| + | *Conductive |
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Revision as of 08:44, 17 January 2018
Back to Vacuum Deposition Recipes.
Atomic Layer Deposition (Oxford FlexAL)
Al2O3 deposition (ALD)
AlN deposition (ALD)
HfO2 deposition (ALD)
Pt deposition (ALD)
(Platinum)
- To be added, recipe available. Contact Bill Mitchell.
Ru (ALD)
(Ruthenium)
- To be added, recipe available. Contact Bill Mitchell.
SiO2 deposition (ALD)
ZnO deposition (ALD)
- Need Data Al:ZnO
ZrO2 deposition (ALD)
TiO2 deposition (ALD)
- TiO2 200 recipe WJM_TDMAT_H2O_r2 water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer
TiN deposition (ALD)
- To be added, recipe available. Contact Bill Mitchell.
- Conductive