Difference between revisions of "Atomic Layer Deposition Recipes"
Jump to navigation
Jump to search
| Line 1: | Line 1: | ||
{{recipes|Vacuum Deposition}} |
{{recipes|Vacuum Deposition}} |
||
=[[Atomic Layer Deposition (Oxford FlexAL)]]= |
=[[Atomic Layer Deposition (Oxford FlexAL)]]= |
||
| − | ==Al{{sub|2}}O{{sub|3}} deposition== |
+ | ==Al{{sub|2}}O{{sub|3}} deposition (ALD)== |
*{{fl|ALD-Al2O3-300-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 300}} |
*{{fl|ALD-Al2O3-300-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 300}} |
||
| Line 8: | Line 8: | ||
*{{fl|ALD-Al2O3-100-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 100}} |
*{{fl|ALD-Al2O3-100-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 100}} |
||
| − | ==AlN deposition== |
+ | ==AlN deposition (ALD)== |
*{{fl|ALD-AlN-300-recipe.pdf|AlN 300}} |
*{{fl|ALD-AlN-300-recipe.pdf|AlN 300}} |
||
| − | ==HfO{{sub|2}} deposition== |
+ | ==HfO{{sub|2}} deposition (ALD)== |
*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}} |
*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}} |
||
*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}} |
*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}} |
||
| − | ==SiO{{sub|2}} deposition== |
+ | ==SiO{{sub|2}} deposition (ALD)== |
*{{fl|ALD-SiO2-100-recipe.pdf|SiO{{sub|2}} 100}} |
*{{fl|ALD-SiO2-100-recipe.pdf|SiO{{sub|2}} 100}} |
||
*{{fl|ALD-SiO2-300-recipe.pdf|SiO{{sub|2}} 300}} |
*{{fl|ALD-SiO2-300-recipe.pdf|SiO{{sub|2}} 300}} |
||
| − | ==ZrO{{sub|2}} deposition== |
+ | ==ZrO{{sub|2}} deposition (ALD)== |
*{{fl|ALD-ZrO2-300-recipe.pdf|ZrO{{sub|2}} 300}} |
*{{fl|ALD-ZrO2-300-recipe.pdf|ZrO{{sub|2}} 300}} |
||
Revision as of 11:35, 6 September 2012
Back to Vacuum Deposition Recipes.