Difference between revisions of "Atomic Layer Deposition Recipes"

From UCSB Nanofab Wiki
Jump to navigation Jump to search
Line 1: Line 1:
 
{{recipes|Vacuum Deposition}}
 
{{recipes|Vacuum Deposition}}
 
=[[Atomic Layer Deposition (Oxford FlexAL)]]=
 
=[[Atomic Layer Deposition (Oxford FlexAL)]]=
==Al{{sub|2}}O{{sub|3}} deposition==
+
==Al{{sub|2}}O{{sub|3}} deposition (ALD)==
  
 
*{{fl|ALD-Al2O3-300-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 300}}
 
*{{fl|ALD-Al2O3-300-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 300}}
Line 8: Line 8:
 
*{{fl|ALD-Al2O3-100-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 100}}
 
*{{fl|ALD-Al2O3-100-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 100}}
  
==AlN deposition==
+
==AlN deposition (ALD)==
 
*{{fl|ALD-AlN-300-recipe.pdf|AlN 300}}
 
*{{fl|ALD-AlN-300-recipe.pdf|AlN 300}}
  
==HfO{{sub|2}} deposition==
+
==HfO{{sub|2}} deposition (ALD)==
 
*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}}
 
*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}}
 
*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}}
 
*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}}
  
==SiO{{sub|2}} deposition==
+
==SiO{{sub|2}} deposition (ALD)==
 
*{{fl|ALD-SiO2-100-recipe.pdf|SiO{{sub|2}} 100}}
 
*{{fl|ALD-SiO2-100-recipe.pdf|SiO{{sub|2}} 100}}
 
*{{fl|ALD-SiO2-300-recipe.pdf|SiO{{sub|2}} 300}}
 
*{{fl|ALD-SiO2-300-recipe.pdf|SiO{{sub|2}} 300}}
  
==ZrO{{sub|2}} deposition==
+
==ZrO{{sub|2}} deposition (ALD)==
 
*{{fl|ALD-ZrO2-300-recipe.pdf|ZrO{{sub|2}} 300}}
 
*{{fl|ALD-ZrO2-300-recipe.pdf|ZrO{{sub|2}} 300}}

Revision as of 11:35, 6 September 2012