Difference between revisions of "Atomic Layer Deposition Recipes"
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*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}} |
*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}} |
||
*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}} |
*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}} |
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| + | |||
| + | ==SiO{{sub|2}} deposition== |
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| + | *{{fl|ALD-SiO2-100-recipe.pdf|SiO{{sub|2}} 100}} |
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| + | *{{fl|ALD-SiO2-300-recipe.pdf|SiO{{sub|2}} 300}} |
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| + | |||
| + | ==ZrO{{sub|2}} deposition== |
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| + | *{{fl|ALD-ZrO2-300-recipe.pdf|ZrO{{sub|2}} 300}} |
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Revision as of 11:33, 6 September 2012
Back to Vacuum Deposition Recipes.