Difference between revisions of "Atomic Layer Deposition Recipes"
Jump to navigation
Jump to search
Line 7: | Line 7: | ||
*{{fl|ALD-Al2O3-Plasma-300C-Recipe.pdf|Al{{sub|2}}O{{sub|3}} plasma 300C}} |
*{{fl|ALD-Al2O3-Plasma-300C-Recipe.pdf|Al{{sub|2}}O{{sub|3}} plasma 300C}} |
||
*{{fl|ALD-Al2O3-100-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 100}} |
*{{fl|ALD-Al2O3-100-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 100}} |
||
+ | |||
+ | ==AlN deposition== |
||
+ | *{{fl|ALD-AlN-300-recipe.pdf|AlN 300}} |
||
+ | |||
+ | ==HfO{{sub|2}} deposition== |
||
+ | *{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}} |
||
+ | *{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}} |
Revision as of 11:31, 6 September 2012
Back to Vacuum Deposition Recipes.