Difference between revisions of "Atomic Layer Deposition Recipes"

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*{{fl|ALD-Al2O3-Plasma-300C-Recipe.pdf|Al{{sub|2}}O{{sub|3}} plasma 300C}}
 
*{{fl|ALD-Al2O3-Plasma-300C-Recipe.pdf|Al{{sub|2}}O{{sub|3}} plasma 300C}}
 
*{{fl|ALD-Al2O3-100-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 100}}
 
*{{fl|ALD-Al2O3-100-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 100}}
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==AlN deposition==
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*{{fl|ALD-AlN-300-recipe.pdf|AlN 300}}
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==HfO{{sub|2}} deposition==
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*{{fl|ALD-HfO2-100-recipe.pdf|HfO{{sub|2}} 100}}
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*{{fl|ALD-HfO2-300-recipe.pdf|HfO{{sub|2}} 300}}

Revision as of 11:31, 6 September 2012