Difference between revisions of "Atomic Layer Deposition Recipes"

From UCSB Nanofab Wiki
Jump to navigation Jump to search
Line 1: Line 1:
 
{{recipes|Vacuum Deposition}}
 
{{recipes|Vacuum Deposition}}
 
=[[Atomic Layer Deposition (Oxford FlexAL)]]=
 
=[[Atomic Layer Deposition (Oxford FlexAL)]]=
==Al{{sub|2}}O{{sub|3}} Deposition==
+
==Al{{sub|2}}O{{sub|3}} deposition==
  +
  +
*{{fl|ALD-Al2O3-300-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 300}}
  +
*{{fl|ALD-Al2O3-300-Saturated-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 300 Saturated}}
  +
*{{fl|ALD-Al2O3-Plasma-300C-Recipe.pdf|Al{{sub|2}}O{{sub|3}} plasma 300C}}
  +
*{{fl|ALD-Al2O3-100-Recipe.pdf|Al{{sub|2}}O{{sub|3}} 100}}

Revision as of 11:27, 6 September 2012