Difference between revisions of "Atomic Layer Deposition Recipes"

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(added "contact bill mitchell" and Added Ru)
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==Pt deposition (ALD)==
 
==Pt deposition (ALD)==
*Need Data
+
(Platinum)
 +
*To be added, recipe available.  Contact [[Bill Mitchell]].
 +
 
 +
== Ru (ALD) ==
 +
(Ruthenium)
 +
* To be added, recipe available.  Contact [[Bill Mitchell]].
  
 
==SiO{{sub|2}} deposition (ALD)==
 
==SiO{{sub|2}} deposition (ALD)==
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==TiN deposition (ALD)==
 
==TiN deposition (ALD)==
*Need Data
+
*To be added, recipe available.  Contact [[Bill Mitchell]].
 +
*Conductive

Revision as of 08:44, 17 January 2018

Back to Vacuum Deposition Recipes.

Atomic Layer Deposition (Oxford FlexAL)

Al2O3 deposition (ALD)

AlN deposition (ALD)

HfO2 deposition (ALD)

Pt deposition (ALD)

(Platinum)

Ru (ALD)

(Ruthenium)

SiO2 deposition (ALD)

ZnO deposition (ALD)

  • Need Data Al:ZnO

ZrO2 deposition (ALD)

TiO2 deposition (ALD)

  • TiO2 200 recipe WJM_TDMAT_H2O_r2 water dose 1s (pdf file to be added)gives grow rate 0.9 A/cycle as measured by ellipsometer

TiN deposition (ALD)