Atomic Force Microscope (Bruker ICON)
The Bruker ICON AFM utilizes the latest paradigm in Atomic Force Microscopy - PeakForce Tapping (PFT), a method that combines the best features of the legacy Contact Mode and Tapping Mode imaging techniques, namely direct force control and intermittent surface contact to reduce damaging lateral forces, to precisely control the probe-to-surface force interaction as pixel-to-pixel force curve measurements. This control results in the most consistent, highest resolution AFM imaging technique that can be used on a wide range of sample types.
Note that the ICON AFM also can also utilize the legacy Contact Mode and Tapping Mode techniques for imaging if required.
In PeakForce Tapping®, the probe periodically taps the sample and the pN-level interaction force is measured directly by the deflection of the cantilever. Through superior force control, the feedback loop keeps the peak force constant, down to 10 pN, in both air and fluid, which is significantly lower than is typically used with other modes, such as TappingMode™ (~1 nN).PeakForce Tapping enables the researcher to precisely control probe-to-sample interaction, providing the lowest available imaging forces. This superior force control results in the most consistent, highest resolution AFM imaging for the widest range of sample types, from the softest biological samples to very hard materials.
provides a variety of high resolution surface imaging techniques and the ability to manipulate or create nanoscale structures directly. Techniques available for imaging include contact mode AFM, tapping mode AFM, Scanning Tunnelling AFM, Conductive AFM, and Scanning Capacitance Microscopy. With the Nanoman option, the X and Y deflecting piezo-elements are independently controlled, allowing for precise and direct placement of the tip anywhere within the field. Direct manipulation of particles on the surface is then possible by dragging the tip in the desired direction. This feedback control, coupled with direct control of conductive tip and substrate voltages, allows for direct-write oxidation on a variety of surfaces to create or modify nanostructures through local anodization.
- Conductive AFM modules for nA-microAmp current measurements
- Tunneling AFM modulefor pA-nA current measurements
- Scanning Capacitance Microscopy
- Resolution: Sub-nm height-measurement capability; X-Y resolution tip dependent
- Registration tolerance to a known mark: Field size dependent
- Minimum substrate size: small pieces
- Largest substrate size: 100 mm wafer
- Oxidation Line widths: Call for info.