https://wiki.nanofab.ucsb.edu/w/index.php?title=ASML_Stepper_3_Dicing_Guide_Programming&feed=atom&action=history
ASML Stepper 3 Dicing Guide Programming - Revision history
2024-03-28T20:32:38Z
Revision history for this page on the wiki
MediaWiki 1.35.13
https://wiki.nanofab.ucsb.edu/w/index.php?title=ASML_Stepper_3_Dicing_Guide_Programming&diff=158720&oldid=prev
John d: Update: state doesn’t work and workaround.
2021-01-30T18:07:38Z
<p>Update: state doesn’t work and workaround.</p>
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<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 18:07, 30 January 2021</td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div><blockquote>''How to program the ASML DUV Stepper #3 to place dicing guides in between die.''</blockquote></div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div><blockquote>''How to program the ASML DUV Stepper #3 to place dicing guides in between die.''</blockquote></div></td>
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<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div> UPDATE: doesn’t work: Ning tried this and found these patterns were too difficult to see on the disconfirm saw. Demis: new method, use ASML’s Alignment Mark distribution function to use SPM-X/Y marks as dicing guides. Carefully not to distribute too many - there is a software limit on number of exposures per Image. </div></td>
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<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>* Determine a lithography step in the fabrication process during which the addition of dicing guides (crosses) would be acceptable and visible during dicing. There are both positive and negative versions of the Cross pattern.</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>* Determine a lithography step in the fabrication process during which the addition of dicing guides (crosses) would be acceptable and visible during dicing. There are both positive and negative versions of the Cross pattern.</div></td>
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<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>* When programming the job, add an new Image in <code>Wafer Layout > Image Definition</code> for the DicingGuides image, as so:</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>* When programming the job, add an new Image in <code>Wafer Layout > Image Definition</code> for the DicingGuides image, as so:</div></td>
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John d
https://wiki.nanofab.ucsb.edu/w/index.php?title=ASML_Stepper_3_Dicing_Guide_Programming&diff=155388&oldid=prev
John d: Added negative PR image
2018-08-06T06:40:14Z
<p>Added negative PR image</p>
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<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 06:40, 6 August 2018</td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div><blockquote>''How to program the ASML DUV Stepper #3 to place dicing guides in between die.''</blockquote></div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div><blockquote>''How to program the ASML DUV Stepper #3 to place dicing guides in between die.''</blockquote></div></td>
</tr>
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<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>* Determine a lithography step in the fabrication process during which the addition of dicing guides (crosses)<del class="diffchange diffchange-inline"> on '''positive PR'''</del> would be acceptable and visible during dicing.</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>* Determine a lithography step in the fabrication process during which the addition of dicing guides (crosses) would be acceptable and visible during dicing<ins class="diffchange diffchange-inline">. There are both positive and negative versions of the Cross pattern</ins>.</div></td>
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<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>* When programming the job, add an new Image in <code>Wafer Layout > Image Definition</code> for the DicingGuides image, as so:</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>* When programming the job, add an new Image in <code>Wafer Layout > Image Definition</code> for the DicingGuides image, as so:</div></td>
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<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>** Reticle ID: "'''UCSB-OPC1'''" (hyphenated)</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>** Reticle ID: "'''UCSB-OPC1'''" (hyphenated)</div></td>
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<td colspan="2" class="diff-empty"> </td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>** For <u>Positive PR image</u>:</div></td>
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<td class="diff-marker"><a class="mw-diff-movedpara-left" title="Paragraph was moved. Click to jump to new location." href="#movedpara_6_0_rhs">⚫</a></td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div><a name="movedpara_4_0_lhs"></a>** Image <del class="diffchange diffchange-inline">Size</del> (Wafer): X = <del class="diffchange diffchange-inline">0</del>.<del class="diffchange diffchange-inline">90000</del>; Y<del class="diffchange diffchange-inline"> </del>= <del class="diffchange diffchange-inline">0</del>.<del class="diffchange diffchange-inline">90000</del> mm</div></td>
<td colspan="2" class="diff-empty"> </td>
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<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>** Image <del class="diffchange diffchange-inline">Shift</del> (Wafer): X = <del class="diffchange diffchange-inline">-6</del>.<del class="diffchange diffchange-inline">750000</del>; Y= <del class="diffchange diffchange-inline">-9</del>.<del class="diffchange diffchange-inline">450000</del> mm</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div><ins class="diffchange diffchange-inline">*</ins>** Image <ins class="diffchange diffchange-inline">Size</ins> (Wafer): X = <ins class="diffchange diffchange-inline">0</ins>.<ins class="diffchange diffchange-inline">90000</ins>; Y<ins class="diffchange diffchange-inline"> </ins>= <ins class="diffchange diffchange-inline">0</ins>.<ins class="diffchange diffchange-inline">90000</ins> mm</div></td>
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<td colspan="2" class="diff-empty"> </td>
<td class="diff-marker"><a class="mw-diff-movedpara-right" title="Paragraph was moved. Click to jump to old location." href="#movedpara_4_0_lhs">⚫</a></td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div><a name="movedpara_6_0_rhs"></a><ins class="diffchange diffchange-inline">*</ins>** Image <ins class="diffchange diffchange-inline">Shift</ins> (Wafer): X = <ins class="diffchange diffchange-inline">-6</ins>.<ins class="diffchange diffchange-inline">750000</ins>; Y= <ins class="diffchange diffchange-inline">-9</ins>.<ins class="diffchange diffchange-inline">450000</ins> mm</div></td>
</tr>
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<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>** [[File:UCSB Dicing Guides - IMG 1199 annotated.jpg|alt=ASML Programming: Image Definition Screen|none|thumb|400x400px|ASML Programming<del class="diffchange diffchange-inline">:</del> Image Definition Screen]][[File:UCSB Dicing Guides - Image Location on Reticle - 800px.png|alt=Image Definition: Resulting location on Reticle screenshot|none|thumb|400x400px|Image Definition: Location on Reticle]]</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div><ins class="diffchange diffchange-inline">*</ins>** [[File:UCSB Dicing Guides - IMG 1199 annotated.jpg|alt=ASML Programming: Image Definition Screen|none|thumb|400x400px|ASML Programming<ins class="diffchange diffchange-inline"> (Positive PR)</ins> Image Definition Screen]][[File:UCSB Dicing Guides - Image Location on Reticle - 800px.png|alt=Image Definition: Resulting location on Reticle screenshot|none|thumb|400x400px|Image Definition<ins class="diffchange diffchange-inline"> (Positive PR)</ins>: Location on Reticle<ins class="diffchange diffchange-inline">]][[File:GlobalMulti POS - Screen Shot 2018-07-23 at 11.17.23 AM.png|alt=Positive PR Alignment Mark schematic|none|thumb|Positive PR Alignment Mark. Will center the large Cross.</ins>]]</div></td>
</tr>
<tr>
<td colspan="2" class="diff-empty"> </td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>**For <u>Negative PR Image</u>:</div></td>
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<td colspan="2" class="diff-empty"> </td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*** Image Size (wafer scale): X = 0.710000 ; Y = 0.710000 mm</div></td>
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<tr>
<td colspan="2" class="diff-empty"> </td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*** Image Shift (wafer scale): X = 6.750000 ; Y = -9.450000 mm[[File:GlobalMulti NEG - Screen Shot 2018-07-23 at 11.22.19 AM.png|alt=Negative PR pattern schematic|none|thumb|Negative PR pattern]]</div></td>
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<tr>
<td colspan="2" class="diff-empty"> </td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*** ''More info on either pattern can be [[ASML Stepper 3 - UCSB Test Reticles|found here]].''</div></td>
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<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
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<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>* Under <code>Wafer Layout > Image Distribution</code>, add an <code>'''Image-to-Cell Shift'''</code> of '''half the die X/Y size''', and <code>Apply</code> to all die, to place the marks at the corner of every die.</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>* Under <code>Wafer Layout > Image Distribution</code>, add an <code>'''Image-to-Cell Shift'''</code> of '''half the die X/Y size''', and <code>Apply</code> to all die, to place the marks at the corner of every die.</div></td>
</tr>
<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>** The software will only let you place the die at the upper-right (''+X,+Y'') corner. To include the lower-left corners, you will need to make sure you enabled the <code>Wafer Layout > Cell Structure > Die Definition > # of Dies & Minimum per Cell</code> options <del class="diffchange diffchange-inline">so it'll</del> shoot partial die.</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>** The software will only let you place the die at the upper-right (''+X,+Y'') corner. To include the lower-left corners, you will need to make sure you enabled the <code>Wafer Layout > Cell Structure > Die Definition > # of Dies & Minimum per Cell</code> options <ins class="diffchange diffchange-inline">too</ins> shoot partial die<ins class="diffchange diffchange-inline"> at the wafer edges</ins>.</div></td>
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<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>** Make sure they don't expose over any of your other alignment marks!</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>** Make sure they don't expose over any of your other alignment marks!</div></td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
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John d
https://wiki.nanofab.ucsb.edu/w/index.php?title=ASML_Stepper_3_Dicing_Guide_Programming&diff=155367&oldid=prev
John d: initial page, included screenshot and basic programming
2018-08-01T09:40:34Z
<p>initial page, included screenshot and basic programming</p>
<p><b>New page</b></p><div><blockquote>''How to program the ASML DUV Stepper #3 to place dicing guides in between die.''</blockquote><br />
* Determine a lithography step in the fabrication process during which the addition of dicing guides (crosses) on '''positive PR''' would be acceptable and visible during dicing.<br />
* When programming the job, add an new Image in <code>Wafer Layout > Image Definition</code> for the DicingGuides image, as so:<br />
** Reticle ID: "'''UCSB-OPC1'''" (hyphenated)<br />
** Image Size (Wafer): X = 0.90000; Y = 0.90000 mm<br />
** Image Shift (Wafer): X = -6.750000; Y= -9.450000 mm<br />
** [[File:UCSB Dicing Guides - IMG 1199 annotated.jpg|alt=ASML Programming: Image Definition Screen|none|thumb|400x400px|ASML Programming: Image Definition Screen]][[File:UCSB Dicing Guides - Image Location on Reticle - 800px.png|alt=Image Definition: Resulting location on Reticle screenshot|none|thumb|400x400px|Image Definition: Location on Reticle]]<br />
<br />
* Under <code>Wafer Layout > Image Distribution</code>, add an <code>'''Image-to-Cell Shift'''</code> of '''half the die X/Y size''', and <code>Apply</code> to all die, to place the marks at the corner of every die.<br />
** The software will only let you place the die at the upper-right (''+X,+Y'') corner. To include the lower-left corners, you will need to make sure you enabled the <code>Wafer Layout > Cell Structure > Die Definition > # of Dies & Minimum per Cell</code> options so it'll shoot partial die.<br />
** Make sure they don't expose over any of your other alignment marks!<br />
<br />
* [[File:UCSB Dicing Guides - Die Location - 800px.png|alt=Screenshot fo resulting die location|none|thumb|400x400px|Image Distribution: Example dicing mark locations, using Image-to-Cell Shift to place die at corners. ]]</div>
John d