Difference between revisions of "ASML Stepper 3 - UCSB Test Reticles"

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(added resolution charts + coords etc.)
m (→‎Alignment Markers: MA6 mark: contact Brian/Demis for GDS)
(10 intermediate revisions by the same user not shown)
Line 1: Line 1:
 
== Reticle ID: "'''UCSB-OPC1'''" ==
  
== Reticle ID: "'''UCSB-OPC1'''" ==
  +
This reticle is always installed in the system, in the "System Reticles" Box #1.
  +
  +
The reticle contains alignment markers for various NanoFab lithography systems, along with resolution test structures and patterns for calibrating [https://en.wikipedia.org/wiki/Optical_proximity_correction optical proximity correction] on the system. Some patterns are proprietary to the mask designer, so we can not share the full GDS CAD file.
   
 
=== Alignment Markers ===
  
=== Alignment Markers ===
Line 19: Line 22:
 
| -6.750000 , 9.450000
  
| -6.750000 , 9.450000
 
|ImageShift references the center of the -X- "global" mark.
  
|ImageShift references the center of the -X- "global" mark.
  +
The <nowiki>==|||</nowiki> "Local" mark is X+200µm to the right
−
The ==
  
−
|| "Local" mark is X+200µm to the right
  
   
 
has 1.1mm margin on all sides
  
has 1.1mm margin on all sides
−
|[[File:Stepper align - Screen Shot 2018-07-23 at 11.24.31 AM.png|frameless|213x213px]]
 +
|White is Chrome, Pattern is Clear[[File:Stepper align - Screen Shot 2018-07-23 at 11.24.31 AM.png|frameless|213x213px]]
 
|-
  
|-
−
|Multi-Purpose Alignment Mark - Positive
 +
|E-Beam Litho Alignment Mark - Positive
 
|0.900000 , 0.900000
  
|0.900000 , 0.900000
 
| -6.750000 , -9.450000
  
| -6.750000 , -9.450000
Line 32: Line 34:
   
 
0.925mm margin on all sides
  
0.925mm margin on all sides
  +
|White is Chrome, Pattern is Clear
−  
  +
[[File:GlobalMulti POS - Screen Shot 2018-07-23 at 11.17.23 AM.png|frameless|145x145px]]
−
>> Use this for Dicing Alginment Guides
  
−
|[[File:GlobalMulti POS - Screen Shot 2018-07-23 at 11.17.23 AM.png|frameless|145x145px]]
  
 
|-
  
|-
−
|Multi-Purpose Alignment Mark - Positive
 +
|E-Beam Litho Alignment Mark - Negative
 
|0.710000 , 0.710000
  
|0.710000 , 0.710000
 
|6.750000 , -9.450000
  
|6.750000 , -9.450000
Line 42: Line 43:
 
Smaller "+" mark is (0.225,-0.225)mm down-right
  
Smaller "+" mark is (0.225,-0.225)mm down-right
   
−
Blank space on left+top sides
 +
Blank (masked) space on left+top sides
   
 
1.0mm margin on all sides
  
1.0mm margin on all sides
  +
|Striped area is Clear
−
|[[File:GlobalMulti NEG - Screen Shot 2018-07-23 at 11.22.19 AM.png|frameless|115x115px]]
  
  +
[[File:GlobalMulti NEG - Screen Shot 2018-07-23 at 11.22.19 AM.png|frameless|115x115px]]
  +
|-
  +
|Contact_Mark
  +
|0.564000 , 0.564000
  +
|6.750000 , 9.450000
  +
|ImageShift references the center of the contact alignment mark "+"
  +
  +
with 1.1mm margin on all sides
  +
  +
Note the Polarity - will ''expose'' a ~550µm area.
  +
  +
Contact [[Demis D. John|Demis]] or [[Brian Thibeault|Brian]] for the CAD file for the male/female version of this mark.
  +
|White is Chrome, Striped area is Clear
  +
[[File:Align Front - Screen Shot 2018-07-23 at 11.32.16 AM.png|frameless|146x146px]]
 
|}
  
|}
   
 
=== Resolution Test Charts ===
  
=== Resolution Test Charts ===
−
The Resolution test charts are repeated all across the reticle, in order to test for lens aberrations. You can have the system window-off only a single resolution chart, but since they are placed closely together on the reticle, it's very likely that partial shots of adjacent charts will also be exposed.
 +
The Resolution test charts are repeated all across the reticle, in order to test for lens aberrations. You can have the system expose only a single resolution chart, but since they are placed closely together on the reticle, it's very likely that partial shots of adjacent charts will also be exposed.
   
−
In addition, the repeating cells allow us to test for the proper [https://en.wikipedia.org/wiki/Optical_proximity_correction optical proximity correction] algorithm. The Five <code>Dense_...</code> patterns are for calibrating the OPC algorithm, and are not for user analysis.
 +
In addition, the repeating cells allow us to test for the proper [https://en.wikipedia.org/wiki/Optical_proximity_correction optical proximity correction] (OPC) algorithm. The Five <code>Dense_...</code> patterns are for calibrating the OPC algorithm, and are not for user analysis.
   
 
==== Calibration Chart Layout ====
  
==== Calibration Chart Layout ====
−
[[File:UCSB cal - Screen Shot 2018-07-23 at 12.06.58 PM.png|alt=Layout of the repeating calibration charts|none|thumb|512x512px|Layout of the repeating calibration charts]]
 +
Cell name is "''UCSB_Cal''", with coordinates below pointing to center of this cell.[[File:UCSB cal - Screen Shot 2018-07-23 at 12.06.58 PM.png|alt=Layout of the repeating calibration charts|none|thumb|512x512px|Layout of the repeating calibration charts]]
   
 
==== Resolution Chart Schematic ====
  
==== Resolution Chart Schematic ====
 
"resolution_chart_ORIG" cell in the above.
  
"resolution_chart_ORIG" cell in the above.
−
[[File:Resolution Chart - Screen Shot 2018-07-23 at 1.36.31 PM.png|alt=Resolution Chart Layout schematic|none|thumb|400x400px|Resolution Chart Layout, with res. test from 2.00µm to 0.130µm]]
 +
[[File:Resolution Chart - Screen Shot 2018-07-23 at 1.36.31 PM.png|alt=Resolution Chart Layout schematic|none|thumb|400x400px|'''"resolution_chart_ORIG":''' Resolution Chart Layout, with res. test from 2.00µm to 0.130µm]]
   
 
The ""resolution_chart_OPC" version has an optical proximity correction algorithm applied:
  
The ""resolution_chart_OPC" version has an optical proximity correction algorithm applied:
−
[[File:Resolution chart OPC - Screen Shot 2018-07-23 at 1.40.48 PM.png|alt=OPC'd Resolution Chart Layout schematic|none|thumb|395x395px|OPC'd Resolution Chart Layout, with res. test from 2.0µm to 0.130µm]]
 +
[[File:Resolution chart OPC - Screen Shot 2018-07-23 at 1.40.48 PM.png|alt=OPC'd Resolution Chart Layout schematic|none|thumb|395x395px|'''"resolution_chart_OPC":''' OPC'd Resolution Chart Layout, with res. test from 2.0µm to 0.130µm]]
   
−
==== Coords for "UCSB_Cal" Resolution Test Patterns ====
 +
==== Coords for "resolution_chart" Calibration patterns ====
  +
''Image coords for each of the "resolution_chart_ORIG" cells. You can pick just one of these for shooting a resolution test structure. The purpose of the many different locations is to check for variations due to lens aberrations. You could just choose one near the center of the plate to test your process, or you could choose a chart that is in a similar location as the pattern you're shooting on your mask plate.''
−
Each of the above cells is repeated on the following coordinates:
  
  +
  +
''Note that some portion of the adjacent patterns will likely be exposed as well, due to the patterns not being surrounded by 1mm of chrome. Make sure you set your Cell Size large enough to make sure the bleed-over doesn't overlap with adjacent die.''
  +
{| class="wikitable"
  +
!Image Size
  +
X , Y
  +
  +
(Wafer, mm)
  +
!Image Shift
  +
X
  +
  +
(Wafer, mm)
  +
!Image Shift
  +
Y
  +
  +
(Wafer, mm)
  +
|-
  +
|0.605 , 1.005
  +
| -10.115000
  +
|12.150000
  +
|-
  +
|same for each
  +
| -7.415000
  +
|12.150000
  +
|-
  +
|" "
  +
| -4.715000
  +
|12.150000
  +
|-
  +
|" "
  +
| -2.015000
  +
|12.150000
  +
|-
  +
|" "
  +
|0.685000
  +
|12.150000
  +
|-
  +
|" "
  +
|3.385000
  +
|12.150000
  +
|-
  +
|" "
  +
|6.085000
  +
|12.150000
  +
|-
  +
|" "
  +
|8.785000
  +
|12.150000
  +
|-
  +
!
  +
!
  +
!
  +
|-
  +
|
  +
| -10.115000
  +
|9.450000
  +
|-
  +
|
  +
| colspan="2" |''Alignment Marker''
  +
|-
  +
|
  +
| -4.715000
  +
|9.450000
  +
|-
  +
|
  +
| -2.015000
  +
|9.450000
  +
|-
  +
|
  +
|0.685000
  +
|9.450000
  +
|-
  +
|
  +
|3.385000
  +
|9.450000
  +
|-
  +
|
  +
| colspan="2" |''Alignment Marker''
  +
|-
  +
|
  +
|8.785000
  +
|9.450000
  +
|-
  +
!
  +
!
  +
!
  +
|-
  +
|
  +
| -10.115000
  +
|6.750000
  +
|-
  +
|
  +
| -7.415000
  +
|6.750000
  +
|-
  +
|
  +
| -4.715000
  +
|6.750000
  +
|-
  +
|
  +
| -2.015000
  +
|6.750000
  +
|-
  +
|
  +
|0.685000
  +
|6.750000
  +
|-
  +
|
  +
|3.385000
  +
|6.750000
  +
|-
  +
|
  +
|6.085000
  +
|6.750000
  +
|-
  +
|
  +
|8.785000
  +
|6.750000
  +
|-
  +
!
  +
!
  +
!
  +
|-
  +
|
  +
| -10.115000
  +
|4.050000
  +
|-
  +
|
  +
| -7.415000
  +
|4.050000
  +
|-
  +
|
  +
| -4.715000
  +
|4.050000
  +
|-
  +
|
  +
| -2.015000
  +
|4.050000
  +
|-
  +
|
  +
|0.685000
  +
|4.050000
  +
|-
  +
|
  +
|3.385000
  +
|4.050000
  +
|-
  +
|
  +
|6.085000
  +
|4.050000
  +
|-
  +
|
  +
|8.785000
  +
|4.050000
  +
|-
  +
!
  +
!
  +
!
  +
|-
  +
|
  +
| -10.115000
  +
|1.350000
  +
|-
  +
|
  +
| -7.415000
  +
|1.350000
  +
|-
  +
|
  +
| -4.715000
  +
|1.350000
  +
|-
  +
|
  +
| -2.015000
  +
|1.350000
  +
|-
  +
|
  +
|0.685000
  +
|1.350000
  +
|-
  +
|
  +
|3.385000
  +
|1.350000
  +
|-
  +
|
  +
|6.085000
  +
|1.350000
  +
|-
  +
|
  +
|8.785000
  +
|1.350000
  +
|-
  +
!
  +
!
  +
!
  +
|-
  +
|
  +
| -10.115000
  +
| -1.350000
  +
|-
  +
|
  +
| -7.415000
  +
| -1.350000
  +
|-
  +
|
  +
| -4.715000
  +
| -1.350000
  +
|-
  +
|
  +
| -2.015000
  +
| -1.350000
  +
|-
  +
|
  +
|0.685000
  +
| -1.350000
  +
|-
  +
|
  +
|3.385000
  +
| -1.350000
  +
|-
  +
|
  +
|6.085000
  +
| -1.350000
  +
|-
  +
|
  +
|8.785000
  +
| -1.350000
  +
|-
  +
!
  +
!
  +
!
  +
|-
  +
|
  +
| -10.115000
  +
| -4.050000
  +
|-
  +
|
  +
| -7.415000
  +
| -4.050000
  +
|-
  +
|
  +
| -4.715000
  +
| -4.050000
  +
|-
  +
|
  +
| -2.015000
  +
| -4.050000
  +
|-
  +
|
  +
|0.685000
  +
| -4.050000
  +
|-
  +
|
  +
|3.385000
  +
| -4.050000
  +
|-
  +
|
  +
|6.085000
  +
| -4.050000
  +
|-
  +
|
  +
|8.785000
  +
| -4.050000
  +
|-
  +
!
  +
!
  +
!
  +
|-
  +
|
  +
| -10.115000
  +
| -6.750000
  +
|-
  +
|
  +
| -7.415000
  +
| -6.750000
  +
|-
  +
|
  +
| -4.715000
  +
| -6.750000
  +
|-
  +
|
  +
| -2.015000
  +
| -6.750000
  +
|-
  +
|
  +
|0.685000
  +
| -6.750000
  +
|-
  +
|
  +
|3.385000
  +
| -6.750000
  +
|-
  +
|
  +
|6.085000
  +
| -6.750000
  +
|-
  +
|
  +
|8.785000
  +
| -6.750000
  +
|-
  +
!
  +
!
  +
!
  +
|-
  +
|
  +
| -10.115000
  +
| -9.450000
  +
|-
  +
|
  +
| colspan="2" |''Alignment Marker''
  +
|-
  +
|
  +
| -4.715000
  +
| -9.450000
  +
|-
  +
|
  +
| -2.015000
  +
| -9.450000
  +
|-
  +
|
  +
|0.685000
  +
| -9.450000
  +
|-
  +
|
  +
|3.385000
  +
| -9.450000
  +
|-
  +
|
  +
| colspan="2" |''Alignment Marker''
  +
|-
  +
|
  +
|8.785000
  +
| -9.450000
  +
|-
  +
!
  +
!
  +
!
  +
|-
  +
|
  +
| -10.115000
  +
| -12.150000
  +
|-
  +
|
  +
| -7.415000
  +
| -12.150000
  +
|-
  +
|
  +
| -4.715000
  +
| -12.150000
  +
|-
  +
|
  +
| -2.015000
  +
| -12.150000
  +
|-
  +
|
  +
|0.685000
  +
| -12.150000
  +
|-
  +
|
  +
|3.385000
  +
| -12.150000
  +
|-
  +
|
  +
|6.085000
  +
| -12.150000
  +
|-
  +
|
  +
|8.785000
  +
| -12.150000
  +
|}
  +
  +
==== Coords for "UCSB_Cal" Calibration Patterns ====
  +
Each of the above "''UCSB_Cal''" cells, including all 7 patterns, is repeated on the following coordinates across the plate (coords are to the center of the "''UCSB_Cal''" cell):
 
{| class="wikitable"
  
{| class="wikitable"
 
!Image Size
  
!Image Size
Line 87: Line 473:
 
|12.150000
  
|12.150000
 
|-
  
|-
−
|
 +
|" "
 
| -4.050000
  
| -4.050000
 
|12.150000
  
|12.150000
 
|-
  
|-
−
|
 +
|" "
 
| -1.350000
  
| -1.350000
 
|12.150000
  
|12.150000
 
|-
  
|-
−
|
 +
|" "
 
|1.350000
  
|1.350000
 
|12.150000
  
|12.150000
 
|-
  
|-
−
|
 +
|" "
 
|4.050000
  
|4.050000
 
|12.150000
  
|12.150000
 
|-
  
|-
−
|
 +
|" "
 
|6.750000
  
|6.750000
 
|12.150000
  
|12.150000
 
|-
  
|-
−
|
 +
|" "
 
|9.450000
  
|9.450000
 
|12.150000
  
|12.150000
 
|-
  
|-
  +
! colspan="3" |
−
|
  
−
|
  
−
|
  
 
|-
  
|-
 
|
  
|
Line 119: Line 503:
 
|9.450000
  
|9.450000
 
|-
  
|-
  +
|
−
|Alignment Marker
  
  +
| colspan="2" |''Alignment Marker''
−
|–
  
−
|–
  
 
|-
  
|-
 
|
  
|
Line 139: Line 522:
 
|9.450000
  
|9.450000
 
|-
  
|-
  +
|
−
|Alignment Marker
  
  +
| colspan="2" |''Alignment Marker''
−
|–
  
−
|–
  
 
|-
  
|-
 
|
  
|
Line 147: Line 529:
 
|9.450000
  
|9.450000
 
|-
  
|-
  +
! colspan="3" |
−
|
  
−
|
  
−
|
  
 
|-
  
|-
 
|
  
|
Line 183: Line 563:
 
|6.750000
  
|6.750000
 
|-
  
|-
  +
! colspan="3" |
−
|
  
−
|
  
−
|
  
 
|-
  
|-
 
|
  
|
Line 219: Line 597:
 
|4.050000
  
|4.050000
 
|-
  
|-
  +
! colspan="3" |
−
|
  
−
|
  
−
|
  
 
|-
  
|-
 
|
  
|
Line 255: Line 631:
 
|1.350000
  
|1.350000
 
|-
  
|-
  +
! colspan="3" |
−
|
  
−
|
  
−
|
  
 
|-
  
|-
 
|
  
|
Line 291: Line 665:
 
| -1.350000
  
| -1.350000
 
|-
  
|-
  +
! colspan="3" |
−
|
  
−
|
  
−
|
  
 
|-
  
|-
 
|
  
|
Line 327: Line 699:
 
| -4.050000
  
| -4.050000
 
|-
  
|-
  +
! colspan="3" |
−
|
  
−
|
  
−
|
  
 
|-
  
|-
 
|
  
|
Line 363: Line 733:
 
| -6.750000
  
| -6.750000
 
|-
  
|-
  +
! colspan="3" |
−
|
  
−
|
  
−
|
  
 
|-
  
|-
 
|
  
|
Line 371: Line 739:
 
| -9.450000
  
| -9.450000
 
|-
  
|-
  +
|
−
|Alignment Marker
  
  +
| colspan="2" |''Alignment Marker''
−
|–
  
−
|–
  
 
|-
  
|-
 
|
  
|
Line 391: Line 758:
 
| -9.450000
  
| -9.450000
 
|-
  
|-
  +
|
−
|Alignment Marker
  
  +
| colspan="2" |''Alignment Marker''
−
|–
  
−
|–
  
 
|-
  
|-
 
|
  
|
Line 399: Line 765:
 
| -9.450000
  
| -9.450000
 
|-
  
|-
  +
! colspan="3" |
−
|
  
−
|
  
−
|
  
 
|-
  
|-
 
|
  
|

Revision as of 13:50, 4 June 2019

Reticle ID: "UCSB-OPC1"

This reticle is always installed in the system, in the "System Reticles" Box #1.

The reticle contains alignment markers for various NanoFab lithography systems, along with resolution test structures and patterns for calibrating optical proximity correction on the system. Some patterns are proprietary to the mask designer, so we can not share the full GDS CAD file.

Alignment Markers

Image ID Image Size

X , Y

(Wafer, mm)

Image Shift

X , Y

(Wafer, mm)

Notes/Description Schematics
GCA_Align 0.530000 , 0.140000 -6.750000 , 9.450000 ImageShift references the center of the -X- "global" mark.

The ==||| "Local" mark is X+200µm to the right

has 1.1mm margin on all sides

White is Chrome, Pattern is ClearStepper align - Screen Shot 2018-07-23 at 11.24.31 AM.png
E-Beam Litho Alignment Mark - Positive 0.900000 , 0.900000 -6.750000 , -9.450000 ImageShift is the center coords of the larger "+" mark

Smaller "+" mark is (0.225,-0.225)mm down-right

0.925mm margin on all sides

White is Chrome, Pattern is Clear

GlobalMulti POS - Screen Shot 2018-07-23 at 11.17.23 AM.png

E-Beam Litho Alignment Mark - Negative 0.710000 , 0.710000 6.750000 , -9.450000 ImageShift is the center coords of the larger "+" mark

Smaller "+" mark is (0.225,-0.225)mm down-right

Blank (masked) space on left+top sides

1.0mm margin on all sides

Striped area is Clear

GlobalMulti NEG - Screen Shot 2018-07-23 at 11.22.19 AM.png

Contact_Mark 0.564000 , 0.564000 6.750000 , 9.450000 ImageShift references the center of the contact alignment mark "+"

with 1.1mm margin on all sides

Note the Polarity - will expose a ~550µm area.

Contact Demis or Brian for the CAD file for the male/female version of this mark.

White is Chrome, Striped area is Clear

Align Front - Screen Shot 2018-07-23 at 11.32.16 AM.png

Resolution Test Charts

The Resolution test charts are repeated all across the reticle, in order to test for lens aberrations. You can have the system expose only a single resolution chart, but since they are placed closely together on the reticle, it's very likely that partial shots of adjacent charts will also be exposed.

In addition, the repeating cells allow us to test for the proper optical proximity correction (OPC) algorithm. The Five Dense_... patterns are for calibrating the OPC algorithm, and are not for user analysis.

Calibration Chart Layout

Cell name is "UCSB_Cal", with coordinates below pointing to center of this cell.

Layout of the repeating calibration charts
Layout of the repeating calibration charts

Resolution Chart Schematic

"resolution_chart_ORIG" cell in the above.

Resolution Chart Layout schematic
"resolution_chart_ORIG": Resolution Chart Layout, with res. test from 2.00µm to 0.130µm

The ""resolution_chart_OPC" version has an optical proximity correction algorithm applied:

OPC'd Resolution Chart Layout schematic
"resolution_chart_OPC": OPC'd Resolution Chart Layout, with res. test from 2.0µm to 0.130µm

Coords for "resolution_chart" Calibration patterns

Image coords for each of the "resolution_chart_ORIG" cells. You can pick just one of these for shooting a resolution test structure. The purpose of the many different locations is to check for variations due to lens aberrations. You could just choose one near the center of the plate to test your process, or you could choose a chart that is in a similar location as the pattern you're shooting on your mask plate.

Note that some portion of the adjacent patterns will likely be exposed as well, due to the patterns not being surrounded by 1mm of chrome. Make sure you set your Cell Size large enough to make sure the bleed-over doesn't overlap with adjacent die.

Image Size

X , Y

(Wafer, mm)

Image Shift

X

(Wafer, mm)

Image Shift

Y

(Wafer, mm)

0.605 , 1.005 -10.115000 12.150000
same for each -7.415000 12.150000
" " -4.715000 12.150000
" " -2.015000 12.150000
" " 0.685000 12.150000
" " 3.385000 12.150000
" " 6.085000 12.150000
" " 8.785000 12.150000
-10.115000 9.450000
Alignment Marker
-4.715000 9.450000
-2.015000 9.450000
0.685000 9.450000
3.385000 9.450000
Alignment Marker
8.785000 9.450000
-10.115000 6.750000
-7.415000 6.750000
-4.715000 6.750000
-2.015000 6.750000
0.685000 6.750000
3.385000 6.750000
6.085000 6.750000
8.785000 6.750000
-10.115000 4.050000
-7.415000 4.050000
-4.715000 4.050000
-2.015000 4.050000
0.685000 4.050000
3.385000 4.050000
6.085000 4.050000
8.785000 4.050000
-10.115000 1.350000
-7.415000 1.350000
-4.715000 1.350000
-2.015000 1.350000
0.685000 1.350000
3.385000 1.350000
6.085000 1.350000
8.785000 1.350000
-10.115000 -1.350000
-7.415000 -1.350000
-4.715000 -1.350000
-2.015000 -1.350000
0.685000 -1.350000
3.385000 -1.350000
6.085000 -1.350000
8.785000 -1.350000
-10.115000 -4.050000
-7.415000 -4.050000
-4.715000 -4.050000
-2.015000 -4.050000
0.685000 -4.050000
3.385000 -4.050000
6.085000 -4.050000
8.785000 -4.050000
-10.115000 -6.750000
-7.415000 -6.750000
-4.715000 -6.750000
-2.015000 -6.750000
0.685000 -6.750000
3.385000 -6.750000
6.085000 -6.750000
8.785000 -6.750000
-10.115000 -9.450000
Alignment Marker
-4.715000 -9.450000
-2.015000 -9.450000
0.685000 -9.450000
3.385000 -9.450000
Alignment Marker
8.785000 -9.450000
-10.115000 -12.150000
-7.415000 -12.150000
-4.715000 -12.150000
-2.015000 -12.150000
0.685000 -12.150000
3.385000 -12.150000
6.085000 -12.150000
8.785000 -12.150000

Coords for "UCSB_Cal" Calibration Patterns

Each of the above "UCSB_Cal" cells, including all 7 patterns, is repeated on the following coordinates across the plate (coords are to the center of the "UCSB_Cal" cell):

Image Size

X , Y

(Wafer, mm)

Image Shift

X

(Wafer, mm)

Image Shift

Y

(Wafer, mm)

2.610000 , 2.610000 -9.450000 12.150000
same as above -6.750000 12.150000
" " -4.050000 12.150000
" " -1.350000 12.150000
" " 1.350000 12.150000
" " 4.050000 12.150000
" " 6.750000 12.150000
" " 9.450000 12.150000
-9.450000 9.450000
Alignment Marker
-4.050000 9.450000
-1.350000 9.450000
1.350000 9.450000
4.050000 9.450000
Alignment Marker
9.450000 9.450000
-9.450000 6.750000
-6.750000 6.750000
-4.050000 6.750000
-1.350000 6.750000
1.350000 6.750000
4.050000 6.750000
6.750000 6.750000
9.450000 6.750000
-9.450000 4.050000
-6.750000 4.050000
-4.050000 4.050000
-1.350000 4.050000
1.350000 4.050000
4.050000 4.050000
6.750000 4.050000
9.450000 4.050000
-9.450000 1.350000
-6.750000 1.350000
-4.050000 1.350000
-1.350000 1.350000
1.350000 1.350000
4.050000 1.350000
6.750000 1.350000
9.450000 1.350000
-9.450000 -1.350000
-6.750000 -1.350000
-4.050000 -1.350000
-1.350000 -1.350000
1.350000 -1.350000
4.050000 -1.350000
6.750000 -1.350000
9.450000 -1.350000
-9.450000 -4.050000
-6.750000 -4.050000
-4.050000 -4.050000
-1.350000 -4.050000
1.350000 -4.050000
4.050000 -4.050000
6.750000 -4.050000
9.450000 -4.050000
-9.450000 -6.750000
-6.750000 -6.750000
-4.050000 -6.750000
-1.350000 -6.750000
1.350000 -6.750000
4.050000 -6.750000
6.750000 -6.750000
9.450000 -6.750000
-9.450000 -9.450000
Alignment Marker
-4.050000 -9.450000
-1.350000 -9.450000
1.350000 -9.450000
4.050000 -9.450000
Alignment Marker
9.450000 -9.450000
-9.450000 -12.150000
-6.750000 -12.150000
-4.050000 -12.150000
-1.350000 -12.150000
1.350000 -12.150000
4.050000 -12.150000
6.750000 -12.150000
9.450000 -12.150000
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