Difference between revisions of "ASML Stepper 3 - UCSB Test Reticles"

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(→‎Coords for "UCSB_Cal" Calibration Patterns: added coords for each resolution_chart_ORIG)
m (→‎Reticle ID: "UCSB-OPC1": updated description of plate)
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== Reticle ID: "'''UCSB-OPC1'''" ==
  
== Reticle ID: "'''UCSB-OPC1'''" ==
−
This reticle is always installed in the system, in the "System Reticles" Box #1.
 +
This reticle is always installed in the system, in the "System Reticles" Box #1.
  +
  +
The reticle contains alignment markers for various NanoFab lithography systems, along with resolution test structures and patterns for calibrating [https://en.wikipedia.org/wiki/Optical_proximity_correction optical proximity correction] on the system. Some patterns are proprietary to the mask designer, so we can not share the full GDS CAD file.
   
 
=== Alignment Markers ===
  
=== Alignment Markers ===
Line 60: Line 62:
   
 
=== Resolution Test Charts ===
  
=== Resolution Test Charts ===
−
The Resolution test charts are repeated all across the reticle, in order to test for lens aberrations. You can have the system window-off only a single resolution chart, but since they are placed closely together on the reticle, it's very likely that partial shots of adjacent charts will also be exposed.
 +
The Resolution test charts are repeated all across the reticle, in order to test for lens aberrations. You can have the system expose only a single resolution chart, but since they are placed closely together on the reticle, it's very likely that partial shots of adjacent charts will also be exposed.
   
−
In addition, the repeating cells allow us to test for the proper [https://en.wikipedia.org/wiki/Optical_proximity_correction optical proximity correction] algorithm. The Five <code>Dense_...</code> patterns are for calibrating the OPC algorithm, and are not for user analysis.
 +
In addition, the repeating cells allow us to test for the proper [https://en.wikipedia.org/wiki/Optical_proximity_correction optical proximity correction] (OPC) algorithm. The Five <code>Dense_...</code> patterns are for calibrating the OPC algorithm, and are not for user analysis.
   
 
==== Calibration Chart Layout ====
  
==== Calibration Chart Layout ====

Revision as of 23:46, 5 August 2018

Reticle ID: "UCSB-OPC1"

This reticle is always installed in the system, in the "System Reticles" Box #1.

The reticle contains alignment markers for various NanoFab lithography systems, along with resolution test structures and patterns for calibrating optical proximity correction on the system. Some patterns are proprietary to the mask designer, so we can not share the full GDS CAD file.

Alignment Markers

Image ID Image Size

X , Y

(Wafer, mm)

Image Shift

X , Y

(Wafer, mm)

Notes/Description Schematics
GCA_Align 0.530000 , 0.140000 -6.750000 , 9.450000 ImageShift references the center of the -X- "global" mark.

The ==||| "Local" mark is X+200µm to the right

has 1.1mm margin on all sides

White is Chrome, Pattern is ClearStepper align - Screen Shot 2018-07-23 at 11.24.31 AM.png
E-Beam Litho Alignment Mark - Positive 0.900000 , 0.900000 -6.750000 , -9.450000 ImageShift is the center coords of the larger "+" mark

Smaller "+" mark is (0.225,-0.225)mm down-right

0.925mm margin on all sides

>> Use this for Dicing Alginment Guides

White is Chrome, Pattern is Clear

GlobalMulti POS - Screen Shot 2018-07-23 at 11.17.23 AM.png

E-Beam Litho Alignment Mark - Negative 0.710000 , 0.710000 6.750000 , -9.450000 ImageShift is the center coords of the larger "+" mark

Smaller "+" mark is (0.225,-0.225)mm down-right

Blank (masked) space on left+top sides

1.0mm margin on all sides

Striped area is Clear

GlobalMulti NEG - Screen Shot 2018-07-23 at 11.22.19 AM.png

Contact_Mark 0.564000 , 0.564000 6.750000 , 9.450000 ImageShift references the center of the contact alignment mark "+"

with 1.1mm margin on all sides

White is Chrome, Striped area is Clear

Align Front - Screen Shot 2018-07-23 at 11.32.16 AM.png

Resolution Test Charts

The Resolution test charts are repeated all across the reticle, in order to test for lens aberrations. You can have the system expose only a single resolution chart, but since they are placed closely together on the reticle, it's very likely that partial shots of adjacent charts will also be exposed.

In addition, the repeating cells allow us to test for the proper optical proximity correction (OPC) algorithm. The Five Dense_... patterns are for calibrating the OPC algorithm, and are not for user analysis.

Calibration Chart Layout

Cell name is "UCSB_Cal", with coordinates below pointing to center of this cell.

Layout of the repeating calibration charts
Layout of the repeating calibration charts

Resolution Chart Schematic

"resolution_chart_ORIG" cell in the above.

Resolution Chart Layout schematic
"resolution_chart_ORIG": Resolution Chart Layout, with res. test from 2.00µm to 0.130µm

The ""resolution_chart_OPC" version has an optical proximity correction algorithm applied:

OPC'd Resolution Chart Layout schematic
"resolution_chart_OPC": OPC'd Resolution Chart Layout, with res. test from 2.0µm to 0.130µm

Coords for "resolution_chart" Calibration patterns

Image coords for each of the "resolution_chart_ORIG" cells. You can pick just one of these for shooting a resolution test structure. The purpose of the many different locations is to check for variations due to lens aberrations. You could just choose one near the center of the plate to test your process, or you could choose a chart that is in a similar location as the pattern you're shooting on your mask plate.

Note that some portion of the adjacent patterns will likely be exposed as well, due to the patterns not being surrounded by 1mm of chrome. Make sure you set your Cell Size large enough to make sure the bleed-over doesn't overlap with adjacent die.

Image Size

X , Y

(Wafer, mm)

Image Shift

X

(Wafer, mm)

Image Shift

Y

(Wafer, mm)

0.605 , 1.005 -10.115000 12.150000
same for each -7.415000 12.150000
" " -4.715000 12.150000
" " -2.015000 12.150000
" " 0.685000 12.150000
" " 3.385000 12.150000
" " 6.085000 12.150000
" " 8.785000 12.150000
-10.115000 9.450000
Alignment Marker
-4.715000 9.450000
-2.015000 9.450000
0.685000 9.450000
3.385000 9.450000
Alignment Marker
8.785000 9.450000
-10.115000 6.750000
-7.415000 6.750000
-4.715000 6.750000
-2.015000 6.750000
0.685000 6.750000
3.385000 6.750000
6.085000 6.750000
8.785000 6.750000
-10.115000 4.050000
-7.415000 4.050000
-4.715000 4.050000
-2.015000 4.050000
0.685000 4.050000
3.385000 4.050000
6.085000 4.050000
8.785000 4.050000
-10.115000 1.350000
-7.415000 1.350000
-4.715000 1.350000
-2.015000 1.350000
0.685000 1.350000
3.385000 1.350000
6.085000 1.350000
8.785000 1.350000
-10.115000 -1.350000
-7.415000 -1.350000
-4.715000 -1.350000
-2.015000 -1.350000
0.685000 -1.350000
3.385000 -1.350000
6.085000 -1.350000
8.785000 -1.350000
-10.115000 -4.050000
-7.415000 -4.050000
-4.715000 -4.050000
-2.015000 -4.050000
0.685000 -4.050000
3.385000 -4.050000
6.085000 -4.050000
8.785000 -4.050000
-10.115000 -6.750000
-7.415000 -6.750000
-4.715000 -6.750000
-2.015000 -6.750000
0.685000 -6.750000
3.385000 -6.750000
6.085000 -6.750000
8.785000 -6.750000
-10.115000 -9.450000
Alignment Marker
-4.715000 -9.450000
-2.015000 -9.450000
0.685000 -9.450000
3.385000 -9.450000
Alignment Marker
8.785000 -9.450000
-10.115000 -12.150000
-7.415000 -12.150000
-4.715000 -12.150000
-2.015000 -12.150000
0.685000 -12.150000
3.385000 -12.150000
6.085000 -12.150000
8.785000 -12.150000

Coords for "UCSB_Cal" Calibration Patterns

Each of the above "UCSB_Cal" cells, including all 7 patterns, is repeated on the following coordinates across the plate (coords are to the center of the "UCSB_Cal" cell):

Image Size

X , Y

(Wafer, mm)

Image Shift

X

(Wafer, mm)

Image Shift

Y

(Wafer, mm)

2.610000 , 2.610000 -9.450000 12.150000
same as above -6.750000 12.150000
" " -4.050000 12.150000
" " -1.350000 12.150000
" " 1.350000 12.150000
" " 4.050000 12.150000
" " 6.750000 12.150000
" " 9.450000 12.150000
-9.450000 9.450000
Alignment Marker
-4.050000 9.450000
-1.350000 9.450000
1.350000 9.450000
4.050000 9.450000
Alignment Marker
9.450000 9.450000
-9.450000 6.750000
-6.750000 6.750000
-4.050000 6.750000
-1.350000 6.750000
1.350000 6.750000
4.050000 6.750000
6.750000 6.750000
9.450000 6.750000
-9.450000 4.050000
-6.750000 4.050000
-4.050000 4.050000
-1.350000 4.050000
1.350000 4.050000
4.050000 4.050000
6.750000 4.050000
9.450000 4.050000
-9.450000 1.350000
-6.750000 1.350000
-4.050000 1.350000
-1.350000 1.350000
1.350000 1.350000
4.050000 1.350000
6.750000 1.350000
9.450000 1.350000
-9.450000 -1.350000
-6.750000 -1.350000
-4.050000 -1.350000
-1.350000 -1.350000
1.350000 -1.350000
4.050000 -1.350000
6.750000 -1.350000
9.450000 -1.350000
-9.450000 -4.050000
-6.750000 -4.050000
-4.050000 -4.050000
-1.350000 -4.050000
1.350000 -4.050000
4.050000 -4.050000
6.750000 -4.050000
9.450000 -4.050000
-9.450000 -6.750000
-6.750000 -6.750000
-4.050000 -6.750000
-1.350000 -6.750000
1.350000 -6.750000
4.050000 -6.750000
6.750000 -6.750000
9.450000 -6.750000
-9.450000 -9.450000
Alignment Marker
-4.050000 -9.450000
-1.350000 -9.450000
1.350000 -9.450000
4.050000 -9.450000
Alignment Marker
9.450000 -9.450000
-9.450000 -12.150000
-6.750000 -12.150000
-4.050000 -12.150000
-1.350000 -12.150000
1.350000 -12.150000
4.050000 -12.150000
6.750000 -12.150000
9.450000 -12.150000
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