Difference between revisions of "ASML 5500 Mask Making Guidelines"

From UCSB Nanofab Wiki
Jump to navigation Jump to search
m (moved image on page)
m (moved image on page)
Line 1: Line 1:
# Use professional mask/reticle houses: Photronics, Toppan, Compugraphics, etc.  Instruct vendor that this will be used on an ASML 5500/300 system. They have all outer templates for the mask that match our system. You just provide them the data you want printed at wafer scale (1X).
+
# Use commercial mask/reticle houses: Photronics, Toppan, Compugraphics, etc.  Instruct vendor that this will be used on an ASML 5500/300 system. They have all outer templates for the mask that match our system. You just provide them the data you want printed at wafer scale (1X).
 
# Reduction is 4X in ASML, mask makers will scale data to 4X size, which will determine price.  Scale your mask critical dimensions and tolerances accordingly.
 
# Reduction is 4X in ASML, mask makers will scale data to 4X size, which will determine price.  Scale your mask critical dimensions and tolerances accordingly.
 
# Masks must be Quartz, should be 0.25” thick.
 
# Masks must be Quartz, should be 0.25” thick.
 
# Layer-to-layer alignment marks are provided by a calibration mask in our system. No need to  put alignment marks on your mask.
 
# Layer-to-layer alignment marks are provided by a calibration mask in our system. No need to  put alignment marks on your mask.
 
# Field Sizes Available (Wafer Scale, 1x):
 
# Field Sizes Available (Wafer Scale, 1x):
## The full field useable exposure area is limited to the intersection of a 31mm diameter circle and a rectangle of dimensions 22mm x 27mm.  See the schematic below for an illustration.
+
## The full field useable exposure area is limited to the intersection of a 31mm diameter circle and a rectangle of dimensions 22mm x 27mm.  See the schematic below for an illustration. [[File:ASML Stepper 3 - Field Sizes - Screen Shot 2018-02-21 at 1.40.22 PM.png|alt= Schematic of lens/aperture illumination|border|right|204x204px|Schematic of lens/aperture illumination.  Fit a rectangle within this field to get the rectangular field sizes above.]]
 
## For High Resolution 0.63 NA: 21mm in X, 21mm in Y
 
## For High Resolution 0.63 NA: 21mm in X, 21mm in Y
 
## For 0.4 to 0.57 NA: 22mm in X, 22mm in Y
 
## For 0.4 to 0.57 NA: 22mm in X, 22mm in Y
##[[File:ASML Stepper 3 - Field Sizes - Screen Shot 2018-02-21 at 1.40.22 PM.png|alt= Schematic of lens/aperture illumination|border|right|204x204px|Schematic of lens/aperture illumination.  Fit a rectangle within this field to get the rectangular field sizes above.]]
 
 
## Other rectangular sizes available, that fit within the lens/aperture intersection:
 
## Other rectangular sizes available, that fit within the lens/aperture intersection:
 
### 21mm x 23mm
 
### 21mm x 23mm
Line 17: Line 16:
 
### 15mm x 27mm
 
### 15mm x 27mm
 
## In general, 250nm resolution will resolve over the entire field.  Anything smaller than this may not resolve closer the edges of the field where lens quality degrades, and will also have a smaller viable process window (tolerance of exposure/bake/develop parameters).
 
## In general, 250nm resolution will resolve over the entire field.  Anything smaller than this may not resolve closer the edges of the field where lens quality degrades, and will also have a smaller viable process window (tolerance of exposure/bake/develop parameters).
# Spacing between fields : 1mm of Chrome between fields (at wafer scale) in order to blank off unwanted areas.
+
# Spacing between fields : 1mm of Chrome between fields (at wafer scale) in order to blank off unwanted areas.

Revision as of 15:09, 21 February 2018

  1. Use commercial mask/reticle houses: Photronics, Toppan, Compugraphics, etc. Instruct vendor that this will be used on an ASML 5500/300 system. They have all outer templates for the mask that match our system. You just provide them the data you want printed at wafer scale (1X).
  2. Reduction is 4X in ASML, mask makers will scale data to 4X size, which will determine price. Scale your mask critical dimensions and tolerances accordingly.
  3. Masks must be Quartz, should be 0.25” thick.
  4. Layer-to-layer alignment marks are provided by a calibration mask in our system. No need to put alignment marks on your mask.
  5. Field Sizes Available (Wafer Scale, 1x):
    1. The full field useable exposure area is limited to the intersection of a 31mm diameter circle and a rectangle of dimensions 22mm x 27mm. See the schematic below for an illustration.
       Schematic of lens/aperture illumination
    2. For High Resolution 0.63 NA: 21mm in X, 21mm in Y
    3. For 0.4 to 0.57 NA: 22mm in X, 22mm in Y
    4. Other rectangular sizes available, that fit within the lens/aperture intersection:
      1. 21mm x 23mm
      2. 20mm x 24mm
      3. 19mm x 25mm
      4. 18mm x 25.5mm
      5. 17mm x 26mm
      6. 16mm x 26.5mm
      7. 15mm x 27mm
    5. In general, 250nm resolution will resolve over the entire field. Anything smaller than this may not resolve closer the edges of the field where lens quality degrades, and will also have a smaller viable process window (tolerance of exposure/bake/develop parameters).
  6. Spacing between fields : 1mm of Chrome between fields (at wafer scale) in order to blank off unwanted areas.